Institute of Multidisciplinary Research for Advanced Materials and ‡Advanced Institute for Materials Research (WPI-AIMR), Tohoku University , 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan.
ACS Appl Mater Interfaces. 2017 Feb 22;9(7):6591-6598. doi: 10.1021/acsami.6b15139. Epub 2017 Feb 8.
Ultraviolet (UV) nanoimprinting has the potential to fabricate sub-15 nm resin patterns, but the interfacial fluidity of organic monomers near monomer liquid/mold solid interfaces related to filling nanoscale mold recesses with UV-curable resins still remains unclear. In this study, we demonstrated that surface forces and resonance shear measurements were helpful to select a surface modifier appropriate for silica mold surfaces for UV nanoimprinting with the low-viscosity monomer 1,10-decanediol diacrylate. Surface forces between silica surfaces mediated with the diacrylate monomer and fluidities of the monomer were investigated with nanometer resolution. Chemical vapor surface modification of silica surfaces with chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13) gave fluorinated silica surfaces with root-mean-square roughness of less than 0.24 nm suitable for the measurements. When the distance D between two silica surfaces was decreased stepwise in the range of 0-30 nm, monomer viscosity between cleaned silica surfaces increased markedly at D < 6 nm. Surface modification with FAS3-Cl suppressed this increase of interfacial monomer viscosity. In contrast, FAS13-modified silica surfaces caused a jump-in phenomenon at approximately D = 7-9 nm, suddenly decreasing to D = 1 nm as the monomer fluid layer was squeezed out. We concluded that FAS3-Cl was appropriate as a fluorinated surface modifier for silica molds used in UV nanoimprinting with an oleophilic low-viscosity monomer, because the chemisorbed monolayer maintained low monomer viscosity near the surface/monomer interface, in addition to its low surface free energy and short CFCHCH- group.
紫外(UV)压印技术有潜力制造出小于 15nm 的树脂图案,但与用可紫外光固化树脂填充纳米级模具凹陷相关的有机单体在单体液体/模具固体界面附近的界面流动性仍不清楚。在这项研究中,我们证明了表面力和共振剪切测量有助于选择合适的表面改性剂,用于用低粘度单体 1,10-癸二醇二丙烯酸酯进行 UV 纳米压印的二氧化硅模具表面。用二丙烯酸酯单体介导的二氧化硅表面之间的表面力和单体的流动性用纳米分辨率进行了研究。用氯二甲基(3,3,3-三氟丙基)硅烷(FAS3-Cl)和十三氟-1,1,2,2-四氢辛基三甲氧基硅烷(FAS13)对二氧化硅表面进行化学气相表面改性,得到均方根粗糙度小于 0.24nm 的氟化二氧化硅表面,适合进行测量。当两个二氧化硅表面之间的距离 D 在 0-30nm 的范围内逐步减小,在 D < 6nm 时,清洁的二氧化硅表面之间的单体粘度显著增加。用 FAS3-Cl 进行表面改性可以抑制界面单体粘度的这种增加。相比之下,FAS13 改性的二氧化硅表面在大约 D = 7-9nm 处出现了一个跳跃现象,当单体流体层被挤出时,突然减小到 D = 1nm。我们得出结论,FAS3-Cl 是适合用于 UV 纳米压印的亲油低粘度单体的二氧化硅模具的氟化表面改性剂,因为化学吸附的单层在表面/单体界面附近保持低单体粘度,此外,它的表面自由能低,CFCHCH-基团短。