Suppr超能文献

掺铽富氮硅氧氮化物薄膜的结构和发射特性。

Structural and emission properties of Tb-doped nitrogen-rich silicon oxynitride films.

机构信息

CIMAP, Normandie Univ, ENSICAEN, UNICAEN, CEA, CNRS, 6 Boulevard Maréchal Juin 14050 Caen Cedex 4, France.

出版信息

Nanotechnology. 2017 Mar 17;28(11):115710. doi: 10.1088/1361-6528/aa5ca0. Epub 2017 Jan 31.

Abstract

Terbium doped silicon oxynitride host matrix is suitable for various applications such as light emitters compatible with CMOS technology or frequency converter systems for photovoltaic cells. In this study, amorphous Tb ion doped nitrogen-rich silicon oxynitride (NRSON) thin films were fabricated using a reactive magnetron co-sputtering method, with various N flows and annealing conditions, in order to study their structural and emission properties. Rutherford backscattering (RBS) measurements and refractive index values confirmed the silicon oxynitride nature of the films. An electron microscopy analysis conducted for different annealing temperatures (T ) was also performed up to 1200 °C. Transmission electron microscopy (TEM) images revealed two different sublayers. The top layer showed porosities coming from a degassing of oxygen during deposition and annealing, while in the region close to the substrate, a multilayer-like structure of SiO and SiN phases appeared, involving a spinodal decomposition. Upon a 1200 °C annealing treatment, a significant density of Tb clusters was detected, indicating a higher thermal threshold of rare earth (RE) clusterization in comparison to the silicon oxide matrix. With an opposite variation of the N flow during the deposition, the nitrogen excess parameter (N) estimated by RBS measurements was introduced to investigate the Fourier transform infrared (FTIR) spectrum behavior and emission properties. Different vibration modes of the Si-N and Si-O bonds have been carefully identified from the FTIR spectra characterizing such host matrices, especially the 'out-of-phase' stretching vibration mode of the Si-O bond. The highest Tb photoluminescence (PL) intensity was obtained by optimizing the N incorporation and the annealing conditions. In addition, according to these conditions, the integrated PL intensity variation confirmed that the silicon nitride-based host matrix had a higher thermal threshold of rare earth clusterization than its silicon oxide counterpart. Analysis of time-resolved PL intensity versus T showed the impact of Tb clustering on decay times, in agreement with the TEM observations. Finally, PL and PL excitation (PLE) experiments and comparison of the related spectra between undoped and Tb-doped samples were carried out to investigate the impact of the band tails on the excitation mechanism of Tb ions.

摘要

掺铽硅氧氮化物基质适合于各种应用,例如与 CMOS 技术兼容的发光体或光伏电池的频率转换器系统。在这项研究中,使用反应磁控共溅射法制备了非晶态 Tb 离子掺杂富氮硅氧氮化物(NRSON)薄膜,通过改变各种 N 流量和退火条件,研究了其结构和发光性能。卢瑟福背散射(RBS)测量和折射率值证实了薄膜的硅氧氮化物性质。还对不同退火温度(T)的电子显微镜分析进行了研究,最高可达 1200°C。对于不同的退火温度(T)进行了透射电子显微镜(TEM)图像分析,最高可达 1200°C。TEM 图像显示了两个不同的亚层。顶层显示了由于沉积和退火过程中氧气的脱气而产生的孔隙,而在靠近基底的区域,出现了 SiO 和 SiN 相的多层结构,涉及到旋节分解。在 1200°C 的退火处理后,检测到 Tb 团簇的密度显著增加,这表明与硅氧化物基质相比,稀土(RE)团簇化的热阈值更高。随着沉积过程中 N 流量的相反变化,通过 RBS 测量引入了氮过剩参数(N)来研究傅里叶变换红外(FTIR)光谱行为和发光性能。从 FTIR 光谱中仔细识别了 Si-N 和 Si-O 键的不同振动模式,这些光谱特别表征了这种基质,特别是 Si-O 键的“反相”伸缩振动模式。通过优化 N 的掺入和退火条件,获得了最高的 Tb 光致发光(PL)强度。此外,根据这些条件,PL 强度积分变化证实了基于氮化硅的基质具有比其氧化硅对应物更高的稀土团簇化热阈值。PL 强度随时间的变化与 T 的关系分析表明了 Tb 团簇化对衰减时间的影响,这与 TEM 观察结果一致。最后,进行了 PL 和 PL 激发(PLE)实验,并对未掺杂和 Tb 掺杂样品的相关光谱进行了比较,研究了能带尾部对 Tb 离子激发机制的影响。

文献检索

告别复杂PubMed语法,用中文像聊天一样搜索,搜遍4000万医学文献。AI智能推荐,让科研检索更轻松。

立即免费搜索

文件翻译

保留排版,准确专业,支持PDF/Word/PPT等文件格式,支持 12+语言互译。

免费翻译文档

深度研究

AI帮你快速写综述,25分钟生成高质量综述,智能提取关键信息,辅助科研写作。

立即免费体验