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两种抛光系统对整体式二硅酸锂陶瓷表面粗糙度、形貌和弯曲强度的影响。

Effect of Two Polishing Systems on Surface Roughness, Topography, and Flexural Strength of a Monolithic Lithium Disilicate Ceramic.

机构信息

Department of Restorative Dentistry, School of Dentistry, Shahed University, Tehran, Iran.

Department of Epidemiology and Biostatistics, Faculty of Public Health, Tehran, Iran.

出版信息

J Prosthodont. 2019 Jan;28(1):e172-e180. doi: 10.1111/jopr.12586. Epub 2017 Mar 8.

Abstract

PURPOSE

To evaluate the effect of overglazing and two polishing procedures on flexural strength and quality and quantity of surface roughness of a monolithic lithium disilicate ceramic computer-aided design (CAD) after grinding.

MATERIALS AND METHODS

This in vitro study was conducted on 52 partially crystalized bar-shaped specimens (16 × 4 × 1.6 mm) of monolithic lithium disilicate ceramic. The specimens were wet polished with 600-, 800-, and 1200-grit silicon carbide papers for 15 seconds using a grinding/polishing machine at a speed of 300 rpm. Then, the specimens were crystalized and glaze-fired in one step simultaneously and randomly divided into four groups of 13: (I) Glazing group (control); (II) Grinding-glazing group, subjected to grinding with red band finishing diamond bur (46 μm) followed by glazing; (III) Grinding-D+Z group, subjected to grinding and then polishing by coarse, medium, and fine diamond rubber points (D+Z); and (IV) Grinding-OptraFine group, subjected to grinding and then polishing with a two-step diamond rubber polishing system followed by a final polishing step with an OptraFine HP brush and diamond polishing paste. The surface roughness (Ra and Rz) values (μm) were measured by a profilometer, and the mean values were compared using one-way ANOVA and Tamhane's test (post hoc comparison). One specimen of each group was evaluated under a scanning electron microscope (SEM) for surface topography. The three-point flexural strength values of the bars were measured using a universal testing machine at a 0.5 mm/min crosshead speed and recorded. The data were analyzed using one-way ANOVA and Tamhane's test (α = 0.05).

RESULTS

Statistically significant differences were noted among the experimental groups for Ra, Rz (p < 0.0001), and flexural strength values (p < 0.009). The lowest Ra and Rz values were found in the grinding-OptraFine group (0.465 ± 0.153), which were significantly lower than those in glazing (p < 0.03) and grinding-glazing (p < 0.001) groups. The Ra and Rz values were not significantly different between the two polishing systems (p = 0.23 and p = 0.25, respectively). The highest flexural strength was found in the glazing group (283.350 ± 49.854 MPa) without significant differences compared to grinding-glazing (p = 0.98) and grinding-OptraFine groups (p = 0.86). The lowest flexural strength was found in grinding-D+Z group (225.070 ± 17.299), which was significantly different from the value in glazing (p < 0.03) and grinding-glazing (p < 0.04) groups. SEM analysis of polished surfaces revealed regular morphology with some striations.

CONCLUSIONS

The OptraFine system created smoother and more uniform surfaces in terms of quantity (p < 0.03 for Ra, p < 0.01 for Rz) and quality of roughness compared to glazing. The flexural strength of lithium disilicate ceramic after polishing with the OptraFine system was similar to that after glazing (p = 0.86). Despite similar surface roughness after polishing with the two systems, the D+Z system reduced the flexural strength of ceramic (p < 0.03).

摘要

目的

评估上釉和两种抛光程序对整体式硅酸锂陶瓷计算机辅助设计(CAD)在研磨后的弯曲强度以及表面粗糙度的数量和质量的影响。

材料和方法

本体外研究使用 52 个部分结晶的条形样本(16×4×1.6mm)进行,这些样本为整体式硅酸锂陶瓷。使用研磨/抛光机以 300rpm 的速度用 600、800 和 1200 号碳化硅砂纸对样本进行湿抛光 15 秒。然后,样本同时进行结晶和上釉烧制,并随机分为四组,每组 13 个样本:(I)上釉组(对照组);(II)研磨上釉组,先用红色带金刚石修整器(46μm)进行研磨,然后上釉;(III)研磨-D+Z 组,先用粗、中、细金刚石橡胶点(D+Z)进行研磨,然后进行抛光;(IV)研磨-OptraFine 组,先用两步金刚石橡胶抛光系统进行研磨,然后用 OptraFine HP 刷和金刚石抛光膏进行最后抛光步骤。使用轮廓仪测量表面粗糙度(Ra 和 Rz)值(μm),并使用单向方差分析和 Tamhane 检验(事后比较)比较平均值。每组的一个样本在扫描电子显微镜(SEM)下评估表面形貌。使用万能试验机以 0.5mm/min 的十字头速度测量棒材的三点弯曲强度值,并记录。使用单向方差分析和 Tamhane 检验(α=0.05)对数据进行分析。

结果

实验各组的 Ra、Rz(p<0.0001)和弯曲强度值存在显著差异(p<0.009)。研磨-OptraFine 组的 Ra 和 Rz 值最低(0.465±0.153),与上釉(p<0.03)和研磨上釉(p<0.001)组相比,显著更低。两种抛光系统的 Ra 和 Rz 值没有显著差异(p=0.23 和 p=0.25)。上釉组的弯曲强度最高(283.350±49.854MPa),与研磨上釉组(p=0.98)和研磨-OptraFine 组(p=0.86)相比无显著差异。研磨-D+Z 组的弯曲强度最低(225.070±17.299),与上釉组(p<0.03)和研磨上釉组(p<0.04)相比差异显著。抛光表面的 SEM 分析显示出规则的形态,有一些条纹。

结论

与上釉相比,OptraFine 系统在数量(Ra 为 p<0.03,Rz 为 p<0.01)和粗糙度质量方面创造了更光滑和更均匀的表面。用 OptraFine 系统抛光后的硅酸锂陶瓷的弯曲强度与上釉相似(p=0.86)。尽管两种系统抛光后的表面粗糙度相似,但 D+Z 系统降低了陶瓷的弯曲强度(p<0.03)。

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