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界面缺陷对单层过渡金属二硫属化物横向异质结性质的影响

Impact of Interfacial Defects on the Properties of Monolayer Transition Metal Dichalcogenide Lateral Heterojunctions.

作者信息

Cao Zhen, Harb Moussab, Lardhi Sheikha, Cavallo Luigi

机构信息

King Abdullah University of Science and Technology (KAUST), KAUST Catalysis Center (KCC), Physical Sciences and Engineering Division (PSE), Thuwal 23955-6900, Saudi Arabia.

出版信息

J Phys Chem Lett. 2017 Apr 6;8(7):1664-1669. doi: 10.1021/acs.jpclett.7b00518. Epub 2017 Mar 28.

Abstract

We explored the impact of interfacial defects on the stability and optoelectronic properties of monolayer transition metal dichalcogenide lateral heterojunctions using a density functional theory approach. As a prototype, we focused on the MoS-WSe system and found that even a random alloy-like interface with a width of less than 1 nm has only a minimal impact on the band gap and alignment compared to the defect-less interface. The largest impact is on the evolution of the electrostatic potential across the monolayer. Similar to defect-less interfaces, a small number of defects results in an electrostatic potential profile with a sharp change at the interface, which facilitates exciton dissociation. Differently, a large number of defects results in an electrostatic potential profile switching smoothly across the interface, which is expected to reduce the capability of the heterojunction to promote exciton dissociation. These results are generalizable to other transition metal dichalcogenide lateral heterojunctions.

摘要

我们使用密度泛函理论方法探究了界面缺陷对单层过渡金属二硫属化物横向异质结稳定性和光电特性的影响。作为一个原型,我们聚焦于MoS-WSe体系,发现即便宽度小于1 nm的类似随机合金的界面,与无缺陷界面相比,对带隙和能带排列的影响也极小。最大的影响在于单层上静电势的演变。与无缺陷界面类似,少量缺陷会导致静电势分布在界面处有急剧变化,这有利于激子解离。不同的是,大量缺陷会导致静电势分布在界面处平滑切换,这预计会降低异质结促进激子解离的能力。这些结果可推广到其他过渡金属二硫属化物横向异质结。

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