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由石墨烯纳米片制备的氧化石墨烯,并经激光处理还原。

Graphene oxide prepared by graphene nanoplatelets and reduced by laser treatment.

机构信息

Institute for Polymers, Composites and Biomaterials, National Research Council, UOS Napoli/Portici, Piazzale Enrico Fermi, 1, I-80055, Portici, Italy.

出版信息

Nanotechnology. 2017 Jun 2;28(22):224002. doi: 10.1088/1361-6528/aa6c3c. Epub 2017 Apr 10.

Abstract

The Hummers' method for graphite oxide (GO) preparation has been applied to graphite nanoplatelets, in order to achieve higher reaction yield and faster kinetics. Aqueous GO solutions have been used to produce uniform GO films on a polyethylene terephthalate substrate, generating graphene patterns in a controlled way (widths of a few tens of microns). The reduction of GO deposited on the polymeric substrate has been performed by using a Nd:YVO continuous-wave frequency-duplicated laser. Spectroscopic and diffractometric characterizations (FT-IR, visible-NIR, Raman, XPS, and XRD) have shown that the reduction process induced by the laser annealing technique is mainly due to dehydration of the GO layers. It has been obtained by means of a suitable laser optical apparatus, a controlled reduction of GO without damaging the substrate, and precise writing of micro-tracks that can be used as electrically and thermally conductive patterns.

摘要

哈默尔(Hummers)法被用于石墨纳米片的氧化石墨(GO)制备,以提高反应收率和动力学速度。将氧化石墨溶液用于在聚对苯二甲酸乙二醇酯基底上生成均匀的 GO 薄膜,以可控的方式生成石墨烯图案(宽度为几十微米)。通过使用 Nd:YVO 连续波倍频激光对沉积在聚合物基底上的 GO 进行还原。光谱和衍射特性(FT-IR、可见-近红外、拉曼、XPS 和 XRD)表明,激光退火技术诱导的还原过程主要归因于 GO 层的脱水。通过适当的激光光学装置,在不损坏基底的情况下实现了 GO 的受控还原,并精确地写入了可作为导电和导热图案的微轨道。

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