Shu Huabing, Tong Yilong, Guo Jiyuan
College of Mathematics and Physics, Jiangsu University of Science and Technology, Zhenjiang 212001, China.
Phys Chem Chem Phys. 2017 Apr 19;19(16):10644-10650. doi: 10.1039/c7cp00695k.
In zero-gap semimetallic silicene, introducing a sizable band gap without degrading its high carrier mobility is vital to its application in optoelectronic devices. Herein, we design a novel atomically thin system based on silicene and arsenene nanocomposites (Si/As heterostructure), which could open a direct band gap of about 125 meV at the K point in silicene. Moreover, its band gap is linearly controllable over a wide range even with a semiconductor-metal transition by the external electric field (E), with an impressive band gap of up to 328 meV at E = -0.9 V Å. Additionally, the Si/As heterostructure can exhibit pronounced optical absorption in the far infrared range. The binding energy of the first bright exciton is as large as 623 meV, which can be significantly increased with an enhanced E. The tunable bandgap together with a superior optical absorption makes the Si/As heterostructure a potential candidate for nanoelectronic and optoelectronic applications.
在零能隙半金属硅烯中,引入可观的带隙而不降低其高载流子迁移率对其在光电器件中的应用至关重要。在此,我们设计了一种基于硅烯和砷烯纳米复合材料(Si/As异质结构)的新型原子级薄系统,该系统可在硅烯的K点处打开约125 meV的直接带隙。此外,即使通过外部电场(E)实现半导体-金属转变,其带隙在很宽的范围内也是线性可控的,在E = -0.9 V Å时带隙高达328 meV,令人印象深刻。此外,Si/As异质结构在远红外范围内可表现出明显的光吸收。第一个明亮激子的结合能高达623 meV,随着E的增强可显著增加。可调带隙以及优异的光吸收使Si/As异质结构成为纳米电子和光电子应用的潜在候选材料。