Klemencic Georgina M, Mandal Soumen, Werrell Jessica M, Giblin Sean R, Williams Oliver A
School of Physics and Astronomy, Cardiff University, Cardiff, UK.
Sci Technol Adv Mater. 2017 Mar 23;18(1):239-244. doi: 10.1080/14686996.2017.1286223. eCollection 2017.
Chemical vapour deposition (CVD) grown boron-doped nanocrystalline diamond (B-NCD) is an attractive material for the fabrication of high frequency superconducting nanoelectromechanical systems (NEMS) due to its high Young's modulus. The as-grown films have a surface roughness that increases with film thickness due to the columnar growth mechanism. To reduce intrinsic losses in B-NCD NEMS it is crucial to correct for this surface roughness by polishing. In this paper, in contrast to conventional polishing, it is demonstrated that the root-mean-square (RMS) roughness of a 520 nm thick B-NCD film can be reduced by chemical mechanical polishing (CMP) from 44.0 nm to 1.5 nm in 14 hours without damaging the sample or introducing significant changes to the superconducting transition temperature, [Formula: see text], thus enabling the use of B-NCD films in the fabrication of high quality superconducting NEMS.
化学气相沉积（CVD）生长的硼掺杂纳米晶金刚石（B-NCD）因其高杨氏模量，是制造高频超导纳米机电系统（NEMS）的一种有吸引力的材料。由于柱状生长机制，生长态薄膜的表面粗糙度会随着薄膜厚度的增加而增大。为了降低B-NCD NEMS中的固有损耗，通过抛光来校正这种表面粗糙度至关重要。在本文中，与传统抛光不同，结果表明，通过化学机械抛光（CMP），在不损坏样品或不对超导转变温度[公式：见原文]引入显著变化的情况下，14小时内可将520 nm厚的B-NCD薄膜的均方根（RMS）粗糙度从44.0 nm降低至1.5 nm，从而使得B-NCD薄膜能够用于制造高质量的超导NEMS。
