Chemical Engineering Department, University of São Paulo, Av. Prof. Luciano Gualberto, tr. 3, 380, São Paulo, Brazil.
Graduate Program on Environment and Regional Development, University of Oeste Paulista, Raposo Tavares, km 572, Bairro do Limoeiro, Presidente Prudente, São Paulo, Brazil.
Environ Sci Pollut Res Int. 2017 Aug;24(22):18470-18478. doi: 10.1007/s11356-017-9310-0. Epub 2017 Jun 23.
Singlet oxygen (O), hydroxyl radicals (OH), and excited triplet states of organic matter (OM) play a key role in the degradation of pollutants in aquatic environments. The formation rates and quantum yields (Φ) of these reactive intermediates (RI) through photosensitized reactions of dissolved organic matter (DOM) have been reported in the literature for decades. Urban biowaste-derived substances (UW-BOS), a form of organic matter derived from vegetative and urban waste, have recently been shown to be efficient sensitizers in the photo-degradation of different contaminants. Nevertheless, no quantitative measurements of photo-oxidant generation by UW-BOS have been reported. In this study, the formation quantum yields of O and OH, as well as quantum yield coefficients of TMP degradation (indicative of OM formation), were quantified for two UW-BOS samples, under 254-nm UV radiation or simulated sunlight and compared to a DOM standard from the Suwanee River (SRNOM). Values of Φ for UW-BOS samples ranged from Φ(+O) = 8.0 to 8.8 × 10, Φ(+OH) = 4.1 to 4.3 × 10, and f = 1.22 to 1.23 × 10 L Einstein under simulated sunlight and from Φ(+O) = 1.4 to 2.3 × 10, Φ(+OH) = 1.3 to 3.5 × 10, and f = 3.3 to 3.9 × 10 L Einstein under UV. Although UW-BOS are not necessarily better than natural DOM regarding photosensitizing properties, they do sensitize the production of RI and could potentially be used in engineered treatment systems.
单线态氧 (O)、羟基自由基 (OH) 和有机物质的激发三重态 (OM) 在水环境污染中污染物的降解中起着关键作用。几十年来,文献中已经报道了通过溶解有机物质 (DOM) 的光敏反应形成这些反应中间体 (RI) 的形成速率和量子产率 (Φ)。城市生物废物衍生物质 (UW-BOS) 是一种源自植物和城市废物的有机物质,最近已被证明是不同污染物光降解的有效敏化剂。然而,尚未报道 UW-BOS 产生光氧化剂的定量测量。在这项研究中,在 254nm 紫外线辐射或模拟阳光下,对两种 UW-BOS 样品的 O 和 OH 的形成量子产率以及 TMP 降解的量子产率系数(指示 OM 形成)进行了量化,并与 Suwanee 河 (SRNOM) 的 DOM 标准进行了比较。UW-BOS 样品的 Φ 值范围为 Φ(+O) = 8.0 到 8.8 × 10、Φ(+OH) = 4.1 到 4.3 × 10 和 f = 1.22 到 1.23 × 10 L Einstein 在模拟阳光下,从 Φ(+O) = 1.4 到 2.3 × 10、Φ(+OH) = 1.3 到 3.5 × 10 和 f = 3.3 到 3.9 × 10 L Einstein 在 UV 下。尽管 UW-BOS 在光敏性质方面不一定优于天然 DOM,但它们确实敏化 RI 的产生,并且有可能在工程处理系统中使用。