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硼酸功能化无氧化物硅表面用于多巴胺电化学传感。

Boronic Acid-Functionalized Oxide-Free Silicon Surfaces for the Electrochemical Sensing of Dopamine.

机构信息

Institut des Sciences Chimiques de Rennes, UMR 6226 CNRS, Matière Condensée et Systèmes Electroactifs (MaCSE), Université de Rennes 1 , Campus de Beaulieu, 35042 Rennes Cedex, France.

Conservatoire National des Arts et Métiers, Analyse Chimique et Bioanalyse, EPN7, 292 Rue Saint-Martin, 75003 Paris, France- LICSEN, NIMBE, CEA, CNRS, Université Paris-Saclay , 91191 Gif-sur-Yvette, France.

出版信息

Langmuir. 2017 Sep 5;33(35):8693-8699. doi: 10.1021/acs.langmuir.7b00699. Epub 2017 Jul 5.

Abstract

Boronic acid monolayers covalently bound to hydrogen-terminated Si(111) surfaces have been prepared from the UV-directed hydrosilylation reaction of 4-vinylbenzeneboronic acid. X-ray photoelectron spectroscopy (XPS) analysis of the modified surface revealed characteristic peaks from the attached organic molecule with the expected molecular composition and without the oxidation of underlying silicon. From XPS data, the surface coverage was estimated to be ca. 0.34 ± 0.04 ethylbenzene boronic acid chain per surface silicon atom (i.e., (4.4 ± 0.5) × 10 mol cm), which is consistent with a densely packed monolayer. The electrochemical impedance spectroscopy measurements performed at pH 7.4 in the presence of the Fe(CN)/Fe(CN) reporter couple showed specific dopamine-induced changes as a result of the binding of the guest molecule to the immobilized boronate species. The charge-transfer resistance (R) was found to decrease from 4.9 MΩ to 14 kΩ upon increasing the dopamine concentration in the range of 10 μM-1 mM. Furthermore, the presence of the interfering ascorbic acid until a concentration of 10 mM did not significantly change the electrochemical response of the functionalized surface. Comparative electrochemical data obtained at the reference ethylbenzene monolayer provided clear evidence that the immobilized boronic acid units were responsible for the observed changes.

摘要

硼酸酸单层共价键合到氢终止的 Si(111)表面已经通过 4-乙烯基苯硼酸的 UV 导向的硅氢化反应来制备。对修饰表面的 X 光电子能谱(XPS)分析显示出附着的有机分子的特征峰,具有预期的分子组成,并且没有底层硅的氧化。从 XPS 数据估计表面覆盖率约为 0.34 ± 0.04 个乙基苯硼酸链/个表面硅原子(即(4.4 ± 0.5)× 10^-10 mol/cm),这与密集堆积的单层一致。在 pH 7.4 下进行的电化学阻抗谱测量在存在 Fe(CN)₆³⁻/Fe(CN)₆⁴⁻报告偶的情况下进行,由于客体分子与固定化硼酸物种的结合,显示出特定的多巴胺诱导的变化。发现当多巴胺浓度在 10 μM-1 mM 范围内增加时,电荷转移电阻(R)从 4.9 MΩ降低到 14 kΩ。此外,直到浓度为 10 mM 的干扰抗坏血酸不会显著改变功能化表面的电化学响应。在参考乙基苯单层获得的比较电化学数据清楚地证明了固定化硼酸单元是观察到的变化的原因。

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