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在 PbTiO/BiFeO 双层中控制带电异质界面的生长和原子尺度测绘。

Controlled Growth and Atomic-Scale Mapping of Charged Heterointerfaces in PbTiO/BiFeO Bilayers.

机构信息

Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences , Wenhua Road 72, 110016 Shenyang, China.

University of Chinese Academy of Sciences , Yuquan Road 19, 100049 Beijing, China.

出版信息

ACS Appl Mater Interfaces. 2017 Aug 2;9(30):25578-25586. doi: 10.1021/acsami.7b04681. Epub 2017 Jul 18.

Abstract

Functional oxide interfaces have received a great deal of attention owing to their intriguing physical properties induced by the interplay of lattice, orbital, charge, and spin degrees of freedom. Atomic-scale precision growth of the oxide interface opens new corridors to manipulate the correlated features in nanoelectronics devices. Here, we demonstrate that both head-to-head positively charged and tail-to-tail negatively charged BiFeO/PbTiO (BFO/PTO) heterointerfaces were successfully fabricated by designing the BFO/PTO film system deliberately. Aberration-corrected scanning transmission electron microscopic mapping reveals a head-to-head polarization configuration present at the BFO/PTO interface, when the film was deposited directly on a SrTiO (001) substrate. The interfacial atomic structure is reconstructed, and the interfacial width is determined to be 5-6 unit cells. The polarization on both sides of the interface is remarkably enhanced. Atomic-scale structural and chemical element analyses exhibit that the reconstructed interface is rich in oxygen, which effectively compensates for the positive bound charges at the head-to-head polarized BFO/PTO interface. In contrast to the head-to-head polarization configuration, the tail-to-tail BFO/PTO interface exhibits a perfect coherency, when SrRuO was introduced as a buffer layer on the substrates prior to the film growth. The width of this tail-to-tail interface is estimated to be 3-4 unit cells, and oxygen vacancies are supposed to screen the negative polarization bound charge. The formation mechanism of these distinct interfaces was discussed from the perspective of charge redistribution.

摘要

功能氧化物界面由于晶格、轨道、电荷和自旋自由度的相互作用而产生了有趣的物理性质,因此受到了广泛关注。氧化物界面的原子级精确生长为在纳米电子器件中操纵相关特性开辟了新的途径。在这里,我们通过精心设计 BFO/PTO 薄膜系统,成功地制备了头对头带正电和尾对尾带负电的 BiFeO/PbTiO3(BFO/PTO)异质结。通过像差校正扫描透射电子显微镜映射发现,当薄膜直接沉积在 SrTiO3(001)衬底上时,BFO/PTO 界面存在头对头的极化构型。界面的原子结构被重构,界面宽度被确定为 5-6 个单元。界面两侧的极化明显增强。原子尺度的结构和化学元素分析表明,重构的界面富含氧,这有效地补偿了头对头极化的 BFO/PTO 界面上的正束缚电荷。与头对头的极化构型相反,当 SrRuO 在薄膜生长前作为缓冲层引入衬底时,尾对尾的 BFO/PTO 界面表现出完美的一致性。这个尾对尾界面的宽度估计为 3-4 个单元,氧空位被认为可以屏蔽负的极化束缚电荷。从电荷重新分布的角度讨论了这些不同界面的形成机制。

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