Atifi Abderrahman, Ryan Michael D
Marquette University, PO Box 1881, Milwaukee, WI, 53201, USA.
Chemistry. 2017 Sep 21;23(53):13076-13086. doi: 10.1002/chem.201701540. Epub 2017 Aug 30.
The solvent environment around iron porphyrin complexes was examined using mixed molecular/RTIL (room temperature ionic liquid) solutions. The formation of nanodomains in these solutions provides different solvation environments for substrates that could have significant impact on their chemical reactivity. Iron porphyrins (Fe(P)), whose properties are sensitive to solvent and ligation changes, were used to probe the molecular/RTIL environment. The addition of RTILs to molecular solvents shifted the redox potentials to more positive values. When there was no ligation change upon reduction, the shift in the E° values were correlated to the Gutmann acceptor number, as was observed for other porphyrins with similar charge changes. As %RTIL approached 100 %, there was insufficient THF to maintain coordination and the E° values were much more dependent upon the %RTIL. In the case of Fe (P)(Cl), the shifts in the E° values were driven by the release of the chloride ion and its strong attraction to the ionic liquid environment. The spectroscopic properties and distribution of the Fe and Fe species into the RTIL nanodomains were monitored with visible spectroelectrochemistry, F NMR and EPR spectroscopy. This investigation shows that coordination and charge delocalization (metal versus ligand) in the metalloporphyrins redox products can be altered by the RTIL fraction in the solvent system, allowing an easy tuning of their chemical reactivity.
使用混合分子/室温离子液体(RTIL)溶液研究了铁卟啉配合物周围的溶剂环境。这些溶液中纳米域的形成可为底物提供不同的溶剂化环境,这可能对其化学反应性产生重大影响。性质对溶剂和配位变化敏感的铁卟啉(Fe(P))被用于探测分子/RTIL环境。向分子溶剂中添加RTIL会使氧化还原电位向更正的值移动。当还原时没有配位变化时,E°值的变化与古特曼受体数相关,这与其他具有类似电荷变化的卟啉情况相同。当RTIL的百分比接近100%时,四氢呋喃(THF)不足以维持配位,E°值更多地取决于RTIL的百分比。对于Fe(P)(Cl),E°值的变化是由氯离子的释放及其对离子液体环境的强烈吸引力驱动的。通过可见光谱电化学、F NMR和EPR光谱监测了Fe和Fe物种在RTIL纳米域中的光谱性质和分布。这项研究表明,溶剂体系中RTIL的比例可以改变金属卟啉氧化还原产物中的配位和电荷离域(金属与配体),从而便于调节它们的化学反应性。