深紫外非线性光学材料KSrLiAlBOF：解决KBeBOF中的结构不稳定性问题
Deep-Ultraviolet Nonlinear-Optical Material KSrLiAlBOF: Addressing the Structural Instability Problem in KBeBOF.
作者信息
Wu Hongping, Yu Hongwei, Pan Shilie, Halasyamani P Shiv
机构信息
Key Laboratory of Functional Materials and Devices for Special Environments, Xinjiang Technical Institute of Physics & Chemistry, Chinese Academy of Sciences , 40-1 South Beijing Road, Urumqi 830011, China.
Department of Chemistry, University of Houston , 112 Fleming Building, Houston, Texas 77204, United States.
出版信息
Inorg Chem. 2017 Aug 7;56(15):8755-8758. doi: 10.1021/acs.inorgchem.7b01517. Epub 2017 Jul 25.
A beryllium-free deep-ultraviolet (DUV) nonlinear-optical (NLO) material, KSrAlLiBOF, has been synthesized and characterized. Unlike KBeBOF (KBBF), the reported NLO material does not require the use of toxic BeO in the synthesis, and through the judicious selection of cations, strong interlayer interactions are observed that facilitate the crystal growth. KSrAlLiBOF exhibits second-harmonic generation (SHG) at both 1064 and 532 nm with efficiencies of 1.7KHPO and 0.3β-BaBO and has an absorption edge of 190 nm. Because of the strong interlayer interactions, we were able to grow well-faceted large crystals, 8 × 8 × 5 mm, through a top-seeded-solution-growth technique. With these crystals, we determined a birefringence of 0.0574 at 1064 nm and a type I phase-matching SHG limit of 224 nm.
一种无铍的深紫外（DUV）非线性光学（NLO）材料KSrAlLiBOF已被合成并表征。与KBeBOF（KBBF）不同，这种已报道的NLO材料在合成过程中不需要使用有毒的BeO，并且通过对阳离子的合理选择，观察到了有助于晶体生长的强层间相互作用。KSrAlLiBOF在1064和532 nm处均表现出二次谐波产生（SHG）现象，效率分别为1.7KHPO和0.3β-BaBO，其吸收边为190 nm。由于存在强层间相互作用，我们能够通过顶部籽晶溶液生长技术生长出尺寸为8×8×5 mm、晶面良好的大晶体。利用这些晶体，我们测定了在1064 nm处的双折射为0.0574，以及I型相位匹配SHG极限为224 nm。
Zotero 插件