Department of Civil and Environmental Engineering, Hong Kong University of Science and Technology, Kowloon, Hong Kong, China.
Department of Civil and Environmental Engineering, Hong Kong University of Science and Technology, Kowloon, Hong Kong, China.
J Environ Sci (China). 2017 Aug;58:146-154. doi: 10.1016/j.jes.2017.06.014. Epub 2017 Jun 23.
The formation of disinfection by-products (DBPs) from the degradation of N,N-diethyl-3-methyl benzoyl amide (DEET) and ibuprofen (IBP) by the ultraviolet irradiation (UV)/chlorine process and subsequent post-chlorination was investigated and compared with the UV/HO process. The pseudo first-order rate constants of the degradation of DEET and IBP by the UV/chlorine process were 2 and 3.1 times higher than those by the UV/HO process, respectively, under the tested conditions. This was due to the significant contributions of both reactive chlorine species (RCS) and hydroxyl radicals (HO) in the UV/chlorine process. Trichloromethane, 1,1,1-trichloro-2-propanone and dichloroacetic acid were the major known DBPs formed after 90% of both DEET and IBP that were degraded by the UV/chlorine process. Their yields increased by over 50% after subsequent 1-day post-chlorination. The detected DBPs after the degradation of DEET and IBP comprised 13.5% and 19.8% of total organic chlorine (TOCl), respectively, and the proportions increased to 19.8% and 33.9% after subsequent chlorination, respectively. In comparison to the UV/HO process accompanied with post-chlorination, the formation of DBPs and TOCl in the UV/chlorine process together with post-chlorination was 5%-63% higher, likely due to the generation of more DBP precursors from the attack of RCS, in addition to HO.
紫外线(UV)/氯气工艺及后续加氯过程中,N,N-二乙基-3-甲基苯甲酰胺(DEET)和布洛芬(IBP)降解生成消毒副产物(DBPs)的情况,并与 UV/HO 工艺进行了比较。在测试条件下,UV/氯气工艺中 DEET 和 IBP 的降解的伪一级速率常数分别比 UV/HO 工艺高 2 倍和 3.1 倍。这是因为在 UV/氯气工艺中,活性氯(RCS)和羟基自由基(HO)都有显著贡献。三氯甲烷、1,1,1-三氯-2-丙酮和二氯乙酸是在 UV/氯气工艺降解 90%的 DEET 和 IBP 后形成的主要已知 DBPs。在随后的 1 天加氯后,它们的产量增加了 50%以上。DEET 和 IBP 降解后检测到的 DBPs 分别占总有机氯(TOCl)的 13.5%和 19.8%,随后加氯后,其比例分别增加到 19.8%和 33.9%。与伴随后续加氯的 UV/HO 工艺相比,UV/氯气工艺及后续加氯过程中 DBPs 和 TOCl 的生成分别高出 5%-63%,这可能是由于 RCS 的攻击产生了更多的 DBP 前体,除 HO 外。