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调控二维金属/半导体界面中的p型肖特基势垒:MoSe₂和WSe₂上的硼片

Tuning the p-type Schottky barrier in 2D metal/semiconductor interface:boron-sheet on MoSe, and WSe.

作者信息

Couto W R M, Miwa R H, Fazzio A

机构信息

Instituto de Física, Universidade Federal de Uberlândia, CP 593, 38400-902, Uberlândia, MG, Brazil. Instituto Federal do Triângulo Mineiro, 38600-000, Paracatu, MG, Brazil.

出版信息

J Phys Condens Matter. 2017 Oct 11;29(40):405002. doi: 10.1088/1361-648X/aa7f0c. Epub 2017 Aug 31.

Abstract

Van der Waals (vdW) metal/semiconductor heterostructures have been investigated through first-principles calculations. We have considered the recently synthesized borophene (Mannix et al 2015 Science 350 1513), and the planar boron sheets (S1 and S2) (Feng et al 2016 Nat. Chem. 8 563) as the 2D metal layer, and the transition metal dichalcogenides (TMDCs) MoSe, and WSe as the semiconductor monolayer. We find that the energetic stability of those 2D metal/semiconductor heterojunctions is mostly ruled by the vdW interactions; however, chemical interactions also take place in borophene/TMDC. The electronic charge transfer at the metal/semiconductor interface has been mapped, where we find a a net charge transfer from the TMDCs to the boron sheets. Further electronic structure calculations reveal that the metal/semiconductor interfaces, composed by planar boron sheets S1 and S2, present a p-type Schottky barrier which can be tuned to a p-type ohmic contact by an external electric field.

摘要

已通过第一性原理计算对范德华(vdW)金属/半导体异质结构进行了研究。我们将最近合成的硼烯(Mannix等人,2015年,《科学》350 1513)以及平面硼片(S1和S2)(Feng等人,2016年,《自然·化学》8 563)视为二维金属层,将过渡金属二卤化物(TMDCs)MoSe₂和WSe₂视为半导体单层。我们发现,这些二维金属/半导体异质结的能量稳定性主要由范德华相互作用决定;然而,硼烯/TMDC中也会发生化学相互作用。已绘制出金属/半导体界面处的电荷转移情况,我们发现存在从TMDCs到硼片的净电荷转移。进一步的电子结构计算表明,由平面硼片S1和S2组成的金属/半导体界面呈现出p型肖特基势垒,该势垒可通过外部电场调谐为p型欧姆接触。

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