Center for Applied Physics and Technology, Department of Materials Science and Engineering, HEDPS, Beijing Key Laboratory for Magnetoeletric Materials and Devices, College of Engineering, Peking University, Beijing 100871, China.
Nanoscale. 2018 Jul 19;10(28):13767-13772. doi: 10.1039/c8nr02843e.
Two-dimensional (2D) SnSe is a very promising material for semiconducting devices due to its novel properties. However, the contact behavior between a 2D SnSe sheet and a three-dimensional (3D) metal surface shows an un-tunable Schottky barrier because of the metallization of the SnSe sheet induced by strong Fermi level pinning at the contact interface. In this work, we use graphene rather than 3D metals as the metal electrode which comes into contact with a single-layer SnSe sheet to form a van der Waals (vdW) heterojunction. Based on state-of-the-art theoretical calculations, we find that the intrinsic properties of the SnSe sheet are preserved and the Fermi level pinning is weakened because of the vdW interaction between the SnSe sheet and graphene. We further demonstrate that an Ohmic contact can be realized by doping graphene with boron or nitrogen atoms or using other high-work-function 2D metals such as ZT-MoSe2, ZT-MoS2, or H-NbS2 sheet as the electrode to reduce the Fermi level pinning, leading to a spontaneous hole injection from the electrode to the channel material. This study sheds light on how to tune the Schottky barrier height for better device performance.
二维(2D)SnSe 由于其新颖的性质,是用于半导体器件的很有前途的材料。然而,由于在接触界面处 SnSe 薄片的金属化导致费米能级钉扎,二维 SnSe 薄片与三维(3D)金属表面之间的接触行为表现出不可调谐的肖特基势垒。在这项工作中,我们使用石墨烯而不是 3D 金属作为与单层 SnSe 薄片接触的金属电极,以形成范德华(vdW)异质结。基于最先进的理论计算,我们发现由于 SnSe 薄片和石墨烯之间的 vdW 相互作用,SnSe 薄片的本征性质得以保留,费米能级钉扎作用减弱。我们进一步证明,通过掺杂硼或氮原子来掺杂石墨烯,或者使用其他高功函数的二维金属,如 ZT-MoSe2、ZT-MoS2 或 H-NbS2 薄片作为电极来降低费米能级钉扎,从而实现欧姆接触,导致从电极到沟道材料的自发空穴注入。这项研究阐明了如何调整肖特基势垒高度以获得更好的器件性能。