Chen Hsien-Yeh
Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan.
Beilstein J Nanotechnol. 2017 Jul 4;8:1366-1374. doi: 10.3762/bjnano.8.138. eCollection 2017.
Vapor-deposition processes and the resulting thin polymer films provide consistent coatings that decouple the underlying substrate surface properties and can be applied for surface modification regardless of the substrate material and geometry. Here, various ways to structure these vapor-deposited polymer thin films are described. Well-established and available photolithography and soft lithography techniques are widely performed for the creation of surface patterns and microstructures on coated substrates. However, because of the requirements for applying a photomask or an elastomeric stamp, these techniques are mostly limited to flat substrates. Attempts are also conducted to produce patterned structures on non-flat surfaces with various maskless methods such as light-directed patterning and direct-writing approaches. The limitations for patterning on non-flat surfaces are resolution and cost. With the requirement of chemical control and/or precise accessibility to the linkage with functional molecules, chemically and topographically defined interfaces have recently attracted considerable attention. The multifunctional, gradient, and/or synergistic activities of using such interfaces are also discussed. Finally, an emerging discovery of selective deposition of polymer coatings and the bottom-up patterning approach by using the selective deposition technology is demonstrated.
气相沉积工艺以及由此产生的聚合物薄膜可提供均匀的涂层，这些涂层能使底层基材表面特性解耦，并且无论基材材料和几何形状如何，均可用于表面改性。本文描述了对这些气相沉积聚合物薄膜进行结构化处理的各种方法。为在涂覆基材上创建表面图案和微结构，广泛采用了成熟且可用的光刻和软光刻技术。然而，由于需要使用光掩模或弹性印章，这些技术大多仅限于平面基材。人们也尝试使用各种无掩模方法（如光导向图案化和直接写入方法）在非平面表面上制作图案化结构。在非平面表面上进行图案化的局限性在于分辨率和成本。随着对化学控制和/或与功能分子连接的精确可达性的要求，化学和形貌定义的界面最近受到了相当大的关注。还讨论了使用此类界面的多功能、梯度和/或协同活性。最后，展示了聚合物涂层选择性沉积的新发现以及通过使用选择性沉积技术的自下而上图案化方法。
