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采用近红外光谱基线漂移对高剪切制粒过程进行在线监测。

In-Line Monitoring of a High-Shear Granulation Process Using the Baseline Shift of Near Infrared Spectra.

机构信息

Technology Research & Development Division, Sumitomo Dainippon Pharma Co., Ltd, 3-45, Kurakakiuchi 1-Chome, Osaka-shi, Ibaraki-shi, Osaka, 567-0878, Japan.

Faculty of Pharmacy, Musashino University, Nishitokyo-shi, Tokyo, Japan.

出版信息

AAPS PharmSciTech. 2018 Feb;19(2):710-718. doi: 10.1208/s12249-017-0882-2. Epub 2017 Oct 2.

DOI:10.1208/s12249-017-0882-2
PMID:28971383
Abstract

Although near infrared (NIR) spectra are primarily influenced by undesired variations, i.e., baseline shifts and non-linearity, and many applications of NIR spectroscopy to the real-time monitoring of wet granulation processes have been reported, the granulation mechanisms behind these variations have not been fully discussed. These variations of NIR spectra can be canceled out using appropriate pre-processing techniques prior to spectral analysis. The present study assessed the feasibility of directly using baseline shifts in NIR spectra to monitor granulation processes, because such shifts can reflect changes in the physical properties of the granular material, including particle size, shape, density, and refractive index. Specifically, OPUSGRAN, a novel granulation technology, was investigated by in-line NIR monitoring. NIR spectra were collected using a NIR diffuse reflectance fiber optic probe immersed in a high-shear granulator while simultaneously examining the morphology, particle size, density, strength, and Raman images of the mixture during granulation. The NIR baseline shift pattern was found to be characteristic of the OPUSGRAN technology and was attributed to variations in the light transmittance, reflection, and scattering resulting from changes in the physicochemical properties of the samples during granulation. The baseline shift also exhibited an inflection point around the completion of granulation, and therefore may be used to determine the endpoint of the process. These results suggest that a specific pattern of NIR baseline shifts are associated with the unique OPUSGRAN granulation mechanism and can be applied to monitor the manufacturing process and determine the endpoint.

摘要

虽然近红外(NIR)光谱主要受到不理想的变化的影响,即基线偏移和非线性,并且已经有许多将 NIR 光谱应用于湿法制粒过程的实时监测的报道,但这些变化背后的制粒机制尚未得到充分讨论。可以使用适当的预处理技术在光谱分析之前消除 NIR 光谱的这些变化。本研究评估了直接使用 NIR 光谱中的基线偏移来监测制粒过程的可行性,因为这种偏移可以反映颗粒材料的物理性质的变化,包括粒径、形状、密度和折射率。具体来说,通过在线 NIR 监测研究了新型制粒技术 OPUSGRAN。在高剪切制粒机中使用浸入式 NIR 漫反射光纤探头收集 NIR 光谱,同时在制粒过程中检查混合物的形态、粒径、密度、强度和拉曼图像。发现 NIR 基线偏移模式是 OPUSGRAN 技术的特征,归因于制粒过程中样品物理化学性质变化引起的光透射、反射和散射的变化。基线偏移在制粒完成时也表现出拐点,因此可以用于确定过程的终点。这些结果表明,特定模式的 NIR 基线偏移与独特的 OPUSGRAN 制粒机制相关联,可以用于监测制造过程并确定终点。

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