Yakubovsky Dmitry I, Arsenin Aleksey V, Stebunov Yury V, Fedyanin Dmitry Yu, Volkov Valentyn S
Opt Express. 2017 Oct 16;25(21):25574-25587. doi: 10.1364/OE.25.025574.
We report a comprehensive experimental study of optical and electrical properties of thin polycrystalline gold films in a wide range of film thicknesses (from 20 to 200 nm). Our experimental results are supported by theoretical calculations based on the measured morphology of the fabricated gold films. We demonstrate that the dielectric function of the metal is determined by its structural morphology. Although the fabrication process can be absolutely the same for different films, the dielectric function can strongly depend on the film thickness. Our studies show that the imaginary part of the dielectric function of gold, which is responsible for optical losses, rapidly increases as the film thickness decreases for thicknesses below 80 nm. At the same time, we do not observe a noticeable dependence of optical constants on the film thickness for thicker samples. These findings establish design rules for thin-film plasmonic and nanophotonic devices.
我们报告了一项关于多晶金薄膜在广泛膜厚范围(从20纳米到200纳米)内光学和电学性质的全面实验研究。我们的实验结果得到了基于所制备金薄膜测量形态的理论计算的支持。我们证明金属的介电函数由其结构形态决定。尽管不同薄膜的制备过程可能完全相同,但介电函数可能强烈依赖于膜厚。我们的研究表明,对于厚度低于80纳米的情况,负责光学损耗的金介电函数的虚部随着膜厚减小而迅速增加。同时,对于较厚的样品,我们没有观察到光学常数对膜厚有明显的依赖性。这些发现为薄膜等离子体和纳米光子器件建立了设计规则。