Habibpourmoghadam Atefeh, Lucchetti Liana, Evans Dean R, Reshetnyak Victor Y, Omairat Faissal, Schafforz Samuel L, Lorenz Alexander
Opt Express. 2017 Oct 16;25(21):26148-26159. doi: 10.1364/OE.25.026148.
A chiral nematic (N*) liquid crystal (LC) was hybridized with a z-cut iron doped lithium niobate (Fe:LN) substrate and exposed with a focused continuous wave diode laser beam. The N* LC layer was confined with a cover glass to provide a homogeneous LC layer thickness. Two distinct kinds of test cells were investigated, one with an uncoated glass covering slip and one with an indium tin oxide (ITO) coated cover glass. Photo generated electric fields (generated in the Fe:LN) resulted in a localized defect formation and textural transitions in the N* LC. Due to field confinement, the field induced responses were more localized in samples with ITO coated cover glasses. By scanning the laser beam on programmed trajectories, formation of persistent patterns could be achieved in the N* LC layer. Polarized optical microscopy of the exposed samples revealed that these patterns consisted of adjacent circular Frank-Pryce defects. Exposure with a slightly defocused laser beam could be applied selectively to erase these patterns. Thus, a promising method is reported to generate reconfigurable patterns, photonic motives, and touch sensitive devices in a hybridized N* LC with micron accuracy.
将手性向列相(N*)液晶(LC)与z切割铁掺杂铌酸锂(Fe:LN)衬底混合,并使用聚焦连续波二极管激光束进行照射。N* LC层用盖玻片限制,以提供均匀的LC层厚度。研究了两种不同的测试盒,一种是覆盖有无涂层玻璃片的,另一种是覆盖有氧化铟锡(ITO)涂层盖玻片的。光生电场(在Fe:LN中产生)导致N* LC中出现局部缺陷形成和织构转变。由于场限制,场诱导响应在带有ITO涂层盖玻片的样品中更局部化。通过在编程轨迹上扫描激光束,可以在N* LC层中实现持久图案的形成。对曝光样品的偏振光学显微镜观察表明,这些图案由相邻的圆形弗兰克 - 普赖斯缺陷组成。使用稍微散焦的激光束进行曝光可以选择性地消除这些图案。因此,报道了一种有前景在具有微米精度的混合N* LC中生成可重构图案、光子图案和触摸敏感设备的方法。