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位错的相关三维成像:深入了解半导体晶圆中热滑移的起始

Correlated Three-Dimensional Imaging of Dislocations: Insights into the Onset of Thermal Slip in Semiconductor Wafers.

作者信息

Hänschke D, Danilewsky A, Helfen L, Hamann E, Baumbach T

机构信息

Karlsruhe Institute of Technology (KIT), Institute for Photon Science and Synchrotron Radiation (IPS), 76344 Eggenstein-Leopoldshafen, Germany.

Karlsruhe Institute of Technology (KIT), Laboratory for Applications of Synchrotron Radiation (LAS), 76128 Karlsruhe, Germany.

出版信息

Phys Rev Lett. 2017 Nov 24;119(21):215504. doi: 10.1103/PhysRevLett.119.215504. Epub 2017 Nov 20.

Abstract

Correlated x-ray diffraction imaging and light microscopy provide a conclusive picture of three-dimensional dislocation arrangements on the micrometer scale. The characterization includes bulk crystallographic properties like Burgers vectors and determines links to structural features at the surface. Based on this approach, we study here the thermally induced slip-band formation at prior mechanical damage in Si wafers. Mobilization and multiplication of preexisting dislocations are identified as dominating mechanisms, and undisturbed long-range emission from regenerative sources is discovered.

摘要

关联X射线衍射成像和光学显微镜提供了微米尺度上三维位错排列的确切图像。该表征包括诸如柏氏矢量等整体晶体学特性,并确定与表面结构特征的联系。基于这种方法,我们在此研究硅片中先前机械损伤处热诱导滑带的形成。已识别出预先存在的位错的移动和增殖是主要机制,并发现了来自再生源的不受干扰的长程发射。

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