Bourke Levi, Blaikie Richard J
J Opt Soc Am A Opt Image Sci Vis. 2017 Dec 1;34(12):2243-2249. doi: 10.1364/JOSAA.34.002243.
Dielectric waveguide resonant underlayers are employed in ultra-high NA interference photolithography to effectively double the depth of field. Generally a single high refractive index waveguiding layer is employed. Here multilayer Herpin effective medium methods are explored to develop equivalent multilayer waveguiding layers. Herpin equivalent resonant underlayers are shown to be suitable replacements provided at least one layer within the Herpin trilayer supports propagating fields. In addition, a method of increasing the intensity incident upon the photoresist using resonant overlayers is also developed. This method is shown to greatly enhance the intensity within the photoresist making the use of thicker, safer, non-absorbing, low refractive index matching liquids potentially suitable for large-scale applications.
介质波导共振底层被用于超高数值孔径干涉光刻中，以有效地将景深加倍。通常使用单个高折射率波导层。在此，探索了多层赫平有效介质方法来开发等效的多层波导层。结果表明，只要赫平三层结构中的至少一层支持传播场，赫平等效共振底层就是合适的替代物。此外，还开发了一种使用共振覆盖层来增加入射到光刻胶上光强的方法。该方法被证明能极大地增强光刻胶内的光强，使得使用更厚、更安全、非吸收性、低折射率匹配液有可能适用于大规模应用。
