Wessels W A, Bollmann T R J, Post D, Koster G, Rijnders G
Inorganic Materials Science, MESA Institute for Nanotechnology, University of Twente, P.O. Box 217, NL-7500AE Enschede, The Netherlands.
Rev Sci Instrum. 2017 Dec;88(12):123902. doi: 10.1063/1.5004567.
To visualize the topography of thin oxide films during growth, thereby enabling to study its growth behavior quasi real-time, we have designed and integrated an atomic force microscope (AFM) in a pulsed laser deposition (PLD) vacuum setup. The AFM scanner and PLD target are integrated in a single support frame, combined with a fast sample transfer method, such that in situ microscopy can be utilized after subsequent deposition pulses. The in situ microscope can be operated from room temperature up to 700 °C and at (process) pressures ranging from the vacuum base pressure of 10 mbar up to 1 mbar, typical PLD conditions for the growth of oxide films. The performance of this instrument is demonstrated by resolving unit cell height surface steps and surface topography under typical oxide PLD growth conditions.
为了在薄膜生长过程中可视化其形貌，从而能够近乎实时地研究其生长行为，我们在脉冲激光沉积（PLD）真空装置中设计并集成了一台原子力显微镜（AFM）。AFM扫描器和PLD靶材集成在一个单一的支撑框架中，并结合快速样品转移方法，以便在后续的沉积脉冲之后能够利用原位显微镜进行观察。该原位显微镜可在室温至700°C的温度范围内以及从10 mbar的真空基础压力到1 mbar的（工艺）压力范围内运行，这是氧化物薄膜生长的典型PLD条件。通过在典型的氧化物PLD生长条件下分辨晶胞高度表面台阶和表面形貌，展示了该仪器的性能。
