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氧化石墨烯片层间限域诱导双嵌段共聚物的垂直取向

Perpendicular Orientation of Diblock Copolymers Induced by Confinement between Graphene Oxide Sheets.

作者信息

Choi Ki-In, Kim Tae-Ho, Lee Yeonhee, Kim Hyeri, Lee Hoyeon, Yuan Guangcui, Satija Sushil K, Choi Jae-Hak, Ahn Hyungju, Koo Jaseung

机构信息

Neutron Science Center, Korea Atomic Energy Research Institute (KAERI) , Daejeon 34057, Korea.

Department of Organic Materials Engineering, Chungnam Nation University , Daejeon 34134, Korea.

出版信息

Langmuir. 2018 Jan 30;34(4):1681-1690. doi: 10.1021/acs.langmuir.7b03991. Epub 2018 Jan 17.

Abstract

We have studied an orientation structure of self-assembled block copolymers (dPS-b-PMMA) of deuterated polystyrene (dPS) and poly(methyl methacrylate) (PMMA) confined between graphene oxide (GO) surfaces. The results of combination techniques, such as neutron reflectivity, time-of-flight secondary-ion mass spectrometry, grazing-incidence small-angle X-ray scattering, and scanning electron microscopy, show that self-assembled domains of the block copolymers in thin films near the GO sheets are oriented perpendicular to the surface of the GO monolayers, in contrast to the horizontal lamellar structure of the copolymer thin film in the absence of the GO monolayers. This is due to the amphiphilic nature of the GO, which leads to a nonpreferential interaction of both dPS and PMMA blocks. Double-sided confinement with the GO monolayers further extends the ordering behavior of the dPS-b-PMMA thin films. Continuous vertical orientation of the block copolymer thin films is also obtained in the presence of alternating GO layers within thick copolymer films.

摘要

我们研究了氘代聚苯乙烯(dPS)和聚甲基丙烯酸甲酯(PMMA)的自组装嵌段共聚物(dPS-b-PMMA)在氧化石墨烯(GO)表面之间受限的取向结构。中子反射率、飞行时间二次离子质谱、掠入射小角X射线散射和扫描电子显微镜等组合技术的结果表明,与不存在GO单层时共聚物薄膜的水平层状结构相反,靠近GO片层的薄膜中嵌段共聚物的自组装域垂直于GO单层表面取向。这是由于GO的两亲性质,导致dPS和PMMA嵌段均无优先相互作用。与GO单层的双面限制进一步扩展了dPS-b-PMMA薄膜的有序行为。在厚共聚物薄膜中存在交替的GO层时,也获得了嵌段共聚物薄膜的连续垂直取向。

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