Quiroga Argañaraz B, Cristina L J, Rodríguez L M, Cossaro A, Verdini A, Floreano L, Fuhr J D, Gayone J E, Ascolani H
Centro Atómico Bariloche, CNEA, Av. E. Bustillo 9500, R8402AGP, Bariloche, Argentina.
Phys Chem Chem Phys. 2018 Feb 7;20(6):4329-4339. doi: 10.1039/c7cp06612k.
We performed an exhaustive study of terephthalic acid (TPA) self-assembly on a Cu(100) surface, where first-layer molecules display two sequential phase transitions in the 200-400 K temperature range, corresponding to different stages of molecular deprotonation. We followed the chemical and structural changes by means of high-resolution X-ray photoelectron spectroscopy (XPS) and variable-temperature scanning tunneling microscopy (STM), which were interpreted on the basis of density functional theory (DFT) calculations and photoemission simulations. In order to reveal the spectroscopic contributions of the molecules in different states of deprotonation, we modified the substrate reactivity by deposition of a small amount of Sn, which hampers the deprotonation reaction. We found that the characteristic molecular ribbons of the TPA/Cu(100) α-phase at a low temperature contain a significant fraction of partially deprotonated molecules, in contrast to the expectation of a fully protonated phase, where the self-assembly was claimed to be simply driven by the intermolecular double hydrogen bonds [OHO]. On the basis of our simulations, we propose a model where the carboxylate groups of the partially deprotonated molecules form single hydrogen bonds with the carboxylic groups of the fully protonated molecules. Using real time XPS, we also monitored the kinetics of the deprotonation reaction. We show that the network of mixed single and double hydrogen bonds inhibits further deprotonation up to ∼270 K, whereas the isolated molecules display a much lower deprotonation barrier.
我们对苯二甲酸(TPA)在Cu(100)表面的自组装进行了详尽研究,其中第一层分子在200 - 400 K温度范围内呈现两个连续的相变,这对应于分子去质子化的不同阶段。我们借助高分辨率X射线光电子能谱(XPS)和变温扫描隧道显微镜(STM)跟踪化学和结构变化,并基于密度泛函理论(DFT)计算和光发射模拟对其进行解释。为了揭示处于不同去质子化状态的分子的光谱贡献,我们通过沉积少量Sn来改变衬底的反应活性,这会阻碍去质子化反应。我们发现,与认为自组装仅由分子间双氢键[OHO]驱动的完全质子化相的预期相反,低温下TPA/Cu(100)α相的特征分子带包含相当一部分部分去质子化的分子。基于我们的模拟,我们提出了一个模型,其中部分去质子化分子的羧基与完全质子化分子的羧基形成单氢键。我们还使用实时XPS监测了去质子化反应的动力学。我们表明,混合单氢键和双氢键网络在高达约270 K时会抑制进一步去质子化,而孤立分子的去质子化势垒则低得多。