Institute of Fundamental and Frontier Sciences, University of Electronic Science and Technology of China , Chengdu 610054, P. R. China.
Institute for Nanoscience & Engineering, University of Arkansas , W. Dickson 731, Fayetteville, Arkansas 72701, United States.
ACS Appl Mater Interfaces. 2018 Feb 21;10(7):6755-6763. doi: 10.1021/acsami.7b19160. Epub 2018 Feb 9.
We experimentally demonstrate that the conductivity of graded AlGaN increases as a function of the magnitude of the Al concentration gradient (%Al/nm) due to polarization doping effects, without the use of impurity dopants. Using three up/down-graded AlGaN nanolayers with Al gradients ranging from ∼0.16 to ∼0.28%Al/nm combined in one structure, the effects of polarization engineering for localized electric fields and current transport were investigated. Cross-sectional Kelvin probe force microscopy and conductive atomic force microscopy were used to directly probe the electrical properties of the films with spatial resolution along the thickness of the growth. The experimental profiles of the built-in electric fields and the spreading current found in the graded layers are shown to be consistent with simulations of the field distribution as well as of the electron and hole densities. Finally, it was directly observed that for gradients less than 0.28%Al/nm the native n-type donors still limit polarization-induced hole doping, making p-type conductivity still a challenge due to background impurities and defects.
我们通过实验证明,由于极化掺杂效应,AlGaN 的电导率会随着 Al 浓度梯度(%Al/nm)的大小而增加,而无需使用杂质掺杂剂。我们使用了三个上下渐变的 AlGaN 纳米层,它们的 Al 梯度范围从 ∼0.16 到 ∼0.28%Al/nm,组合在一个结构中,研究了极化工程对局部电场和电流传输的影响。横截面 Kelvin 探针力显微镜和导电原子力显微镜用于直接以空间分辨率沿生长厚度探测薄膜的电特性。在渐变层中发现的内置电场和扩展电流的实验分布与场分布以及电子和空穴密度的模拟结果一致。最后,我们直接观察到,在小于 0.28%Al/nm 的梯度下,本征 n 型施主仍然限制了极化诱导的空穴掺杂,因此由于背景杂质和缺陷,p 型导电性仍然是一个挑战。