Department of Physics, City University of Hong Kong , 83 Tat Chee Avenue, Kowloon 999077, Hong Kong.
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States.
ACS Appl Mater Interfaces. 2018 Feb 28;10(8):7239-7247. doi: 10.1021/acsami.7b18254. Epub 2018 Feb 12.
In this work, we have synthesized CdGaO alloy thin films at room temperature over the entire composition range by radio frequency magnetron sputtering. We found that alloy films with high Ga contents of x > 0.3 are amorphous. Amorphous CdGaO alloys in the composition range of 0.3 < x < 0.5 exhibit a high electron mobility of 10-20 cm V s with a resistivity in the range of 10 to high 10 Ω cm range. The resistivity of the amorphous alloys can also be controlled over 5 orders of magnitude from 7 × 10 to 77 Ω cm by controlling the oxygen stoichiometry. Over the entire composition range, these crystalline and amorphous alloys have a large tunable intrinsic band gap range of 2.2-4.8 eV as well as a conduction band minimum range of 5.8-4.5 eV below the vacuum level. Our results suggest that amorphous CdGaO alloy films with 0.3 < x < 0.4 have favorable optoelectronic properties as transparent conductors on flexible and/or organic substrates, whereas the band edges and electrical conductivity of films with 0.3 < x < 0.7 can be manipulated for transparent thin-film transistors as well as electron transport layers.
在这项工作中,我们通过射频磁控溅射在整个组成范围内室温下合成了 CdGaO 合金薄膜。我们发现,Ga 含量较高(x > 0.3)的合金薄膜是非晶态的。在 0.3 < x < 0.5 的组成范围内,非晶 CdGaO 合金具有高达 10-20 cm V s 的高电子迁移率和 10 到高 10 Ω cm 范围内的电阻率。通过控制氧化学计量比,非晶合金的电阻率也可以在 7×10 到 77 Ω cm 的 5 个数量级范围内进行控制。在整个组成范围内,这些晶态和非晶态合金具有 2.2-4.8 eV 的大可调本征带隙范围以及低于真空能级的 5.8-4.5 eV 的导带最小值范围。我们的结果表明,0.3 < x < 0.4 的非晶 CdGaO 合金薄膜作为柔性和/或有机衬底上的透明导体具有良好的光电性能,而对于 0.3 < x < 0.7 的薄膜,其能带边缘和电导率可以通过透明薄膜晶体管和电子传输层进行控制。