School of Mechanical and Mining Engineering, The University of Queensland, QLD 4072, Australia.
Nanoscale. 2018 Feb 15;10(7):3410-3420. doi: 10.1039/c7nr09423j.
The interfacial adhesion behaviour of a ZnO nanowire-Si substrate system is investigated using an in situ scanning electron microscope (SEM) mechanical peeling technique. The peel front of a nanowire advances via stick-slip events, and an equilibrium between the driving and resistant force to separation occurs immediately prior to a slip event. The interfacial adhesion energy is one order higher than that predicted theoretically by van der Waals interactions. The enhanced adhesion is primarily attributed to chemical and electrostatic interfacial interactions induced by electron irradiation. This work demonstrates that the operating environment of a nanoscale system could dramatically influence its adhesion behaviour. These findings are expected to have significant implications for interpreting the adhesion behaviour exhibited by a 1D nanostructure-substrate system when applying different testing methodologies, and for the fabrication of future NEMS devices.
采用原位扫描电子显微镜（SEM）机械剥离技术研究了 ZnO 纳米线-硅基底系统的界面粘附行为。纳米线的剥离前沿通过粘滑事件推进，在发生滑动事件之前，分离的驱动力和阻力之间达到平衡。界面粘附能比范德华相互作用理论预测的高出一个数量级。增强的粘附主要归因于电子辐照引起的化学和静电界面相互作用。这项工作表明，纳米尺度系统的工作环境会显著影响其粘附行为。这些发现对于解释在应用不同测试方法时 1D 纳米结构-基底系统表现出的粘附行为，以及对于未来的 NEMS 器件的制造，都具有重要意义。
