Kao Ching-Yang, Lin Min-Fa, Nguyen Nhat-Thien, Tsai Hsiao-Hsin, Chang Luh-Maan, Chen Po-Han, Chang Chang-Tang
Department of Civil Engineering, National Taiwan University, Taipei 10617, Taiwan.
Institute of Environmental Engineering and Management, National Taipei University of Technology, Taipei 106, Taiwan.
J Nanosci Nanotechnol. 2018 May 1;18(5):3314-3319. doi: 10.1166/jnn.2018.14645.
A large amount of calcium fluoride sludge is generated by the semiconductor industry every year. It also requires a high amount of fuel consumption using rotor concentrators and thermal oxidizers to treat VOCs. The mesoporous adsorbent prepared by calcium fluoride sludge was used for VOCs treatment. The semiconductor industry employs HMDS to promote the adhesion of photo-resistant material to oxide(s) due to the formation of silicon dioxide, which blocks porous adsorbents. The adsorption of HMDS (Hexamethyldisiloxane) was tested with mesoporous silica materials synthesized from calcium fluoride (CF-MCM). The resulting samples were characterized by XRD, XRF, FTIR, N2-adsorption-desorption techniques. The prepared samples possessed high specific surface area, large pore volume and large pore diameter. The crystal patterns of CF-MCM were similar with Mobil composite matter (MCM-41) from TEM image. The adsorption capacity of HMDS with CF-MCM was 40 and 80 mg g-1, respectively, under 100 and 500 ppm HMDS. The effects of operation parameters, such as contact time and mixture concentration, on the performance of CF-MCM were also discussed in this study.
半导体行业每年会产生大量的氟化钙污泥。使用转子浓缩器和热氧化器处理挥发性有机化合物（VOCs）也需要消耗大量燃料。由氟化钙污泥制备的介孔吸附剂被用于处理VOCs。半导体行业使用六甲基二硅氮烷（HMDS）来促进光刻胶材料与氧化物的粘附，因为会形成二氧化硅，这会堵塞多孔吸附剂。用由氟化钙合成的介孔二氧化硅材料（CF-MCM）测试了HMDS（六甲基二硅氧烷）的吸附性能。通过X射线衍射（XRD）、X射线荧光光谱（XRF）、傅里叶变换红外光谱（FTIR）、氮气吸附-脱附技术对所得样品进行了表征。制备的样品具有高比表面积、大孔容和大孔径。从透射电子显微镜（TEM）图像来看，CF-MCM的晶体结构与美孚合成物质（MCM-41）相似。在100 ppm和500 ppm的HMDS条件下，CF-MCM对HMDS的吸附容量分别为40和80 mg g-1。本研究还讨论了操作参数（如接触时间和混合浓度）对CF-MCM性能的影响。
