Zeng Xiangwei, Chu Jinkui, Kang Weidong, Zhang Ran
Appl Opt. 2018 Mar 1;57(7):1530-1533. doi: 10.1364/AO.57.001530.
Using a reversal nanoimprint and metal evaporation process, we fabricated a micropolarizer array for the 2.5-7 μm wavelength region. The micropolarizer array has a unique unit, which is composed of 2×3 arrays on an intrinsic silicon substrate. Each array consists of a 200 nm period bilayer Al grating in a 1.3 mm×1.3 mm aperture. The transmittance of transverse magnetic polarization of each array is greater than 65% in the 2.5-7 μm wavelength range, and the extinction ratio is over 35 dB in the 3-4 μm and 6-7 μm wavelength range. This fabricated micropolarizer array has lower costs and better compatibility with microfabrication processes.
通过使用反转纳米压印和金属蒸发工艺，我们制造了一种用于2.5 - 7μm波长区域的微偏振器阵列。该微偏振器阵列具有独特的单元，它由本征硅衬底上的2×3阵列组成。每个阵列由在1.3 mm×1.3 mm孔径内的周期为200 nm的双层铝光栅组成。在2.5 - 7μm波长范围内，每个阵列的横向磁偏振透过率大于65%，在3 - 4μm和6 - 7μm波长范围内消光比超过35 dB。这种制造的微偏振器阵列成本较低且与微制造工艺具有更好的兼容性。
