Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, Katahira 2-1-1, Aoba-ku, Sendai 980-8577, Japan.
Phys Chem Chem Phys. 2018 May 23;20(20):13714-13721. doi: 10.1039/c7cp08611c.
X-ray diffraction measurement at the SPring-8 synchrotron was employed to investigate the structures of two types of imidazolium-based ionic liquids (ILs), 1-butyl-3-methylimidazolium bis(trifluoromethanesulfonyl)imide ([C4mim][NTF2]) and 1-butyl-3-methylimidazolium tetrafluoroborate ([C4mim][BF4]), confined between silica surfaces by varying the surface separation distances of ca. 500 nm (bulk liquid), ca. 10 nm, and ca. 2 nm (hard wall thickness). The obtained diffraction profiles and intensities were discussed by considering the structures and properties of the nano-confined ILs between the silica surfaces investigated by resonance shear measurement (RSM) and molecular dynamics simulation (MD) in our previous reports. [C4mim][NTf2] showed two diffraction peaks at q = 8.8 nm-1 (spacing d = 0.71 nm) and at q = 14.0 nm-1 (spacing d = 0.45 nm) at the greatest distance (D = ca. 500 nm), which were assigned to the interval between the same ions (anion-anion or cation-cation) within the polar network of [C4mim][NTf2] and the interval between the neighboring anion-cation, respectively. The positions of these two peaks remained the same at D = ca. 10 nm and at the hard wall (D = ca. 2 nm) and their intensity factor increased, indicating that both the cation and anion existed in the same layer. This result was consistent with the checkerboard structure of [C4mim][NTf2] on the silica surface computer simulated in our previous studies. On the other hand, [C4mim][BF4] showed a peak at q = 15.4 nm-1 (spacing d = 0.41 nm) corresponding to the anion-cation interval at the greatest distance (D = ca. 500 nm). This peak became broader and weaker at D = ca. 12 nm and at D = ca. 2 nm.
采用日本同步辐射光源(SPring-8)的 X 射线衍射测量,研究了两种咪唑基离子液体(ILs),1-丁基-3-甲基咪唑双(三氟甲烷磺酰基)亚胺([C4mim][NTF2])和 1-丁基-3-甲基咪唑四氟硼酸盐([C4mim][BF4]),在约 500nm(本体液体)、约 10nm 和约 2nm(硬壁厚度)的不同表面分离距离下,被限制在二氧化硅表面之间的结构。通过考虑我们之前的共振剪切测量(RSM)和分子动力学模拟(MD)研究的二氧化硅表面之间的纳米受限 ILs 的结构和性质,对获得的衍射轮廓和强度进行了讨论。[C4mim][NTf2]在最大距离(D =约 500nm)下显示出两个衍射峰,在 q = 8.8nm-1(间距 d = 0.71nm)和 q = 14.0nm-1(间距 d = 0.45nm)处,分别归因于[C4mim][NTf2]的偶极网络内相同离子(阴离子-阴离子或阳离子-阳离子)之间的间隔和相邻阴离子-阳离子之间的间隔。在 D =约 10nm 和硬壁(D =约 2nm)时,这两个峰的位置保持不变,其强度因子增加,表明阳离子和阴离子都存在于同一层中。这一结果与我们之前的研究中计算机模拟的二氧化硅表面上[C4mim][NTf2]的棋盘结构一致。另一方面,[C4mim][BF4]在最大距离(D =约 500nm)下显示出一个位于 q = 15.4nm-1(间距 d = 0.41nm)处的峰,对应于阴离子-阳离子间隔。在 D =约 12nm 和 D =约 2nm 时,该峰变宽且减弱。