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阵列单元间距对成像性能影响的量化。

Quantification of the Effect of Array Element Pitch on Imaging Performance.

出版信息

IEEE Trans Ultrason Ferroelectr Freq Control. 2018 Apr;65(4):600-616. doi: 10.1109/TUFFC.2018.2794627.

DOI:10.1109/TUFFC.2018.2794627
PMID:29610090
Abstract

This paper investigates how the pitch of elements in periodic ultrasonic arrays is related to their imaging performance, with particular emphasis on imaging artifacts (grating lobes) arising from discrete spatial sampling. Although the classical Nyquist rules for array element pitch are well known, they only provide the limiting condition needed to eliminate grating lobes from an array with an infinitely large aperture at a single frequency. Physical arrays have finite-sized apertures and most applications employ broadband pulses. For these reasons, grating lobe artifacts are always present at some level, and practical array design is, therefore, based on suppressing grating lobe artifacts to a level appropriate to a given application. In this paper, a theoretical framework is developed that enables the point spread function of a periodic imaging array to be decomposed into the sum of contributions from a main lobe and different orders of grating lobes, thus allowing grating lobe artifacts to be unambiguously quantified. Numerical simulations are used to analyze the performance of 1-D linear arrays in both far-field (steering only) and near-field (focusing only) scenarios, and design guidelines are deduced. It is shown that in general, the classical Nyquist rules are overly conservative and that the pitch of an array can be increased without significantly compromising image quality, provided that certain constraints on ray angles are implemented in the imaging algorithm. Experimental examples are shown that illustrate the practical application to arrays in two configurations.

摘要

本文研究了周期性超声阵列中元素的间距与其成像性能之间的关系,特别关注了由于离散空间采样而产生的成像伪影(栅瓣)。虽然周期性阵列中元素间距的经典奈奎斯特准则是众所周知的,但它们仅提供了在单个频率下消除具有无限大孔径的阵列中栅瓣的限制条件。实际的阵列具有有限的孔径,并且大多数应用都采用宽带脉冲。出于这些原因,栅瓣伪影总是以某种程度存在,因此实际的阵列设计基于将栅瓣伪影抑制到适合给定应用的水平。本文提出了一种理论框架,该框架可以将周期性成像阵列的点扩散函数分解为主瓣和不同阶数的栅瓣的贡献之和,从而可以明确地量化栅瓣伪影。数值模拟用于分析一维线性阵列在远场(仅指向)和近场(仅聚焦)场景中的性能,并推导出设计准则。结果表明,在一般情况下,经典的奈奎斯特准则过于保守,并且只要在成像算法中实施了对射线角度的某些约束,就可以增加阵列的间距而不会显著降低图像质量。本文还展示了两个配置中阵列的实际应用示例。

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