Zhu Yu, Wang Yabing, Sun Tianxi, Sun Xuepeng, Zhang Xiaoyun, Liu Zhiguo, Li Yufei, Zhang Fengshou
Key Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China; Beijing Radiation Center, Beijing 100875, China.
Key Laboratory of Beam Technology of Ministry of Education, College of Nuclear Science and Technology, Beijing Normal University, Beijing 100875, China.
Appl Radiat Isot. 2018 Jul;137:172-176. doi: 10.1016/j.apradiso.2018.04.004. Epub 2018 Apr 4.
A total reflection X-ray fluorescence (TXRF) spectrometer based on an elliptical monocapillary X-ray lens (MXRL) and a parallel polycapillary X-ray lens (PPXRL) was designed. This TXRF instrument has micro focal spot, low divergence and high intensity of incident X-ray beam. The diameter of the focal spot of MXRL was 16.5 µm, and the divergence of the incident X-ray beam was 3.4 mrad. We applied this TXRF instrument to the micro analysis of a single-layer film containing Ni deposited on a Si substrate by metal vapor vacuum arc ion source.
设计了一种基于椭圆单毛细管X射线透镜（MXRL）和平行多毛细管X射线透镜（PPXRL）的全反射X射线荧光（TXRF）光谱仪。该TXRF仪器具有微焦点、低发散度和高入射X射线束强度。MXRL的焦点直径为16.5微米，入射X射线束的发散度为3.4毫弧度。我们将该TXRF仪器应用于通过金属蒸汽真空电弧离子源沉积在硅衬底上的含镍单层薄膜的微分析。
