Hwang Shinae, Lee Seongjae, Ko Jaehyeon, Jang Moongyu
Department of Nano-Medical Devices Engineering, Hallym University, Gangwon-do, 24252, Korea.
Department of Physics, Hanyang University, Seoul, 04763, Korea.
J Nanosci Nanotechnol. 2018 Sep 1;18(9):6270-6273. doi: 10.1166/jnn.2018.15626.
Microscale-pyramidal-structure-arrayed patterned silicon membranes are manufactured using semiconductor processes and potassium hydroxide (KOH) etching techniques for filter applications. The silicon nitride on silicon on the insulator wafer functions as a masking layer, and the roughness of the silicon (100) plane strongly depends on the etching temperature and KOH concentration. To fabricate the membrane filter, a series of dry and wet etching using 45 wt% KOH solutions at the constant temperature of 70 °C was performed. With the dry and wet etching, micro-pyramidal arrays with 300 μm top and 16-20 μm bottom opening sizes were created. The morphological structures were analyzed using scanning electron microscopy. The manufactured membranes were tested as optical directional filters and particle filters.
