School of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044, China.
School of Chemistry and Chemical Engineering, Chongqing University, Chongqing 400044, China.
J Colloid Interface Sci. 2018 Sep 15;526:268-280. doi: 10.1016/j.jcis.2018.04.092. Epub 2018 Apr 25.
Diallyl disulfide (DAD), propyl disulfide (PPD) and dibenzyl disulfide (DBD) flavouring agents as copper corrosion inhibitors in 0.5 mol/L HSO solution were evaluated with multitudinous experiments including electrochemical techniques, morphological characterization measurements, FTIR spectra and theoretical calculations. The electrochemical results indicate that PPD and DBD show mixed-type inhibitors and DAD belongs to cathodic-type inhibitor, and the corrosion inhibition capacity follow order: PPD > DBD > DAD. The adsorption of these compounds on the surface of copper conforms to the Langmuir adsorption isotherm model. Furthermore, theoretical calculations were applied to deeply understand the inhibition mechanism of three disulfide-based compounds.
二烯丙基二硫醚(DAD)、丙基二硫醚(PPD)和二苄基二硫醚(DBD)作为铜腐蚀抑制剂在 0.5 mol/L HSO 溶液中的性能,通过多种实验进行了评估,包括电化学技术、形貌特征测量、FTIR 光谱和理论计算。电化学结果表明,PPD 和 DBD 表现出混合型抑制剂,DAD 属于阴极型抑制剂,其腐蚀抑制能力的顺序为:PPD > DBD > DAD。这些化合物在铜表面的吸附符合 Langmuir 吸附等温线模型。此外,还应用理论计算深入了解了三种基于二硫键的化合物的抑制机制。