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引用本文的文献

1
Investigations of the charge transfer phenomenon at the hybrid dye/BiVO interface under visible radiation.可见辐射下混合染料/钒酸铋界面电荷转移现象的研究。
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射频溅射BiVO薄膜的结构和形态数据。

Structural and morphological data of RF-Sputtered BiVO thin films.

作者信息

Venkatesan R, Velumani S, Ordon K, Makowska-Janusik M, Corbel G, Kassiba A

机构信息

Department of Electrical Engineering (SEES), CINVESTAV-IPN, Zacatenco, Av IPN #2508, Col Zacatenco, D.F. C.P. 07360, Mexico.

Institute of Molecular and Materials of Le Mans - UMR-CNRS 6283, Le Mans University, 70285 Le Mans, Lns France.

出版信息

Data Brief. 2018 Feb 2;17:526-528. doi: 10.1016/j.dib.2018.01.070. eCollection 2018 Apr.

DOI:10.1016/j.dib.2018.01.070
PMID:29876424
原文链接:https://pmc.ncbi.nlm.nih.gov/articles/PMC5988375/
Abstract

Structural and morphological modulation of rf-sputtered BiVO thin films deposited using mechanochemical synthesis prepared BiVO nano-powders as sintered target are included in this data article. The crystalline nature of as-prepared films, namely amorphous and crystalline was acquired with time and temperature dependent in-situ high temperature X-ray diffraction (HT-XRD), at a time interval of 1 h. Typical Fourier transform infrared (FT-IR) spectra of annealed thin film of monoclinic BiVO structure is given. Furthermore, correlation between morphologies of various substrate temperature fabricated BiVO thin films are presented.

摘要

本数据文章包含了使用机械化学合成制备的BiVO纳米粉末作为烧结靶材,通过射频溅射沉积的BiVO薄膜的结构和形态调制。通过原位高温X射线衍射(HT-XRD)在1小时的时间间隔内,随着时间和温度的变化,获得了所制备薄膜的晶体性质,即非晶态和晶态。给出了单斜BiVO结构退火薄膜的典型傅里叶变换红外(FT-IR)光谱。此外,还展示了在不同衬底温度下制备的BiVO薄膜形态之间的相关性。