Friedensen Sarah E, Parkin William M, Mlack Jerome T, Drndić Marija
Department of Physics and Astronomy , University of Pennsylvania , Philadelphia , Pennsylvania 19104 , United States.
ACS Nano. 2018 Jul 24;12(7):6949-6955. doi: 10.1021/acsnano.8b02377. Epub 2018 Jun 22.
We present a process for sculpting BiSe nanoflakes into application-relevant geometries using a high-resolution transmission electron microscope. This process takes several minutes to sculpt small areas and can be used to cut the BiSe into wires and rings, to thin areas of the BiSe, and to drill circular holes and lines. We determined that this method allows for sub 10 nm features and results in clean edges along the drilled regions. Using in situ high-resolution imaging, selected area diffraction, and atomic force microscopy, we found that this lithography process preserves the crystal structure of BiSe. TEM sculpting is more precise and potentially results in cleaner edges than does ion-beam modification; therefore, the promise of this method for thermoelectric and topological devices calls for further study into the transport properties of such structures.
我们展示了一种使用高分辨率透射电子显微镜将BiSe纳米薄片雕刻成与应用相关几何形状的工艺。雕刻小面积区域需要几分钟时间,该工艺可用于将BiSe切割成线和环、使BiSe的区域变薄,以及钻出圆形孔和线。我们确定这种方法能够实现小于10纳米的特征,并在钻孔区域形成清晰的边缘。通过原位高分辨率成像、选区衍射和原子力显微镜,我们发现这种光刻工艺保留了BiSe的晶体结构。与离子束改性相比,透射电子显微镜雕刻更精确,并且可能产生更清晰的边缘;因此,这种方法在热电和拓扑器件方面的前景需要对这类结构的传输特性进行进一步研究。