Advanced Materials Laboratory , Sandia National Laboratories , 1001 University Boulevard, SE , Albuquerque , New Mexico 87106 , United States.
Department of Chemistry , University of Hawaii-Manoa , 2545 McCarthy Mall , Honolulu , Hawaii 96822-2275 , United States.
Inorg Chem. 2018 Aug 6;57(15):8806-8820. doi: 10.1021/acs.inorgchem.8b00630. Epub 2018 Jul 6.
In an effort to generate single-source precursors for the production of metal-siloxide (MSiO ) materials, the tris(trimethylsilyl)silanol (H-SST or H-OSi(SiMe) (1) ligand was reacted with a series of group 4 and 5 metal alkoxides. The group 4 products were crystallographically characterized as [Ti(SST)(OR)] (OR = OPr (2), OBu (3), ONep (4)); [Ti(SST)(OBu )] (5); [Zr(SST)(OBu )(py)] (6); [Zr(SST)(OR)] (OR = OBu (7), ONep, (8)); [Hf(SST)(OBu )] (9); and [Hf(SST)(ONep)(py) ] ( n = 1 (10), n = 2 (10a)) where OPr = OCH(CH), OBu = OC(CH), OBu = O(CH)CH, ONep = OCHC(CH), py = pyridine. The crystal structures revealed varied SST substitutions for: monomeric Ti species that adopted a tetrahedral ( T-4) geometry; monomeric Zr compounds with coordination that varied from T-4 to trigonal bipyramidal ( TBPY-5); and monomeric Hf complexes isolated in a TBPY-5 geometry. For the group 5 species, the following derivatives were structurally identified as [V(SST)(py)] (11), [Nb(SST)(OEt)] (12), [Nb(O)(SST)(py)] (13), 2[H][(Nb(μ-O)(SST))(μ-O)] (14), [NbO(OEt)(SST)·1/5NaO] (15), [Ta(SST)(μ-OEt)(OEt)] (16), and [Ta(SST)(OEt)] (17) where OEt = OCHCH. The group 5 monomeric complexes were solved in a TBPY-5 arrangement, whereas the Ta of the dinculear 16 was solved in an octahedral coordination environment. Thermal analyses of these precursors revealed a stepwise loss of ligand, which indicated their potential utility for generating the MSiO materials. The complexes were thermally processed (350-1100 °C, 4 h, ambient atmosphere), but instead of the desired MSiO , transmission electron microscopy analyses revealed that fractions of the group 4 and group 5 precursors had formed unusual metal oxide silica architectures.
为了生成用于制备金属-硅氧烷 (MSiO) 材料的单源前体,三(三甲基甲硅烷基)硅醇 (H-SST 或 H-OSi(SiMe) (1) 配体与一系列第 4 族和第 5 族金属醇盐反应。第 4 族产物通过晶体学方法确定为 [Ti(SST)(OR)] (OR = OPr (2)、OBu (3)、ONep (4));[Ti(SST)(OBu )] (5);[Zr(SST)(OBu )(py)] (6);[Zr(SST)(OR)] (OR = OBu (7)、ONep (8));[Hf(SST)(OBu )] (9);和 [Hf(SST)(ONep)(py)] (n = 1 (10)、n = 2 (10a)),其中 OPr = OCH(CH),OBu = OC(CH),OBu = O(CH)CH,ONep = OCHC(CH),py = 吡啶。晶体结构揭示了不同的 SST 取代:采用四面体 (T-4) 几何形状的单体 Ti 物种;配位从 T-4 到三角双锥 (TBPY-5) 变化的单体 Zr 化合物;以及在 TBPY-5 几何形状中分离出的单体 Hf 配合物。对于第 5 族物种,以下衍生物通过结构鉴定为 [V(SST)(py)] (11)、[Nb(SST)(OEt)] (12)、[Nb(O)(SST)(py)] (13)、2[H][(Nb(μ-O)(SST))(μ-O)] (14)、[NbO(OEt)(SST)·1/5NaO] (15)、[Ta(SST)(μ-OEt)(OEt)] (16) 和 [Ta(SST)(OEt)] (17),其中 OEt = OCHCH。第 5 族单体配合物以 TBPY-5 排列方式解决,而双核 16 的 Ta 则以八面体配位环境解决。这些前体的热分析显示出配体的逐步损失,这表明它们在生成 MSiO 材料方面具有潜在的用途。复合物在 350-1100°C(4 小时,环境气氛)下进行热处理,但没有形成所需的 MSiO,透射电子显微镜分析表明,第 4 族和第 5 族前体的部分形成了不寻常的金属氧化物-硅石架构。