Effective Resistivity in Collisionless Magnetic Reconnection.

An effective resistivity relevant to collisionless magnetic reconnection (MR) in plasma is presented. It is based on the argument that pitch angle scattering of electrons in the small electron diffusion region around the X line can lead to an effective, resistivity in collisionless plasma. The effective resistivity so obtained is in the form of a power law of the local plasma and magnetic field parameters. Its validity is confirmed by direct collisionless particle-in-cell (PIC) simulation. The result agrees very well with the resistivity (obtained from available data) of a large number of environments susceptible to MR: from the intergalactic and interstellar to solar and terrestrial to laboratory fusion plasmas. The scaling law can readily be incorporated into existing collisional magnetohydrodynamic simulation codes to investigate collisionless MR, as well as serve as a guide to ab initio theoretical investigations of the collisionless MR process.