Lian Hongcheng, Qi Lehua, Luo Jun, Hu Kewen
School of Mechanical Engineering, Northwestern Polytechnical University, Xi'an 710072, People's Republic of China.
J Phys Condens Matter. 2018 Aug 22;30(33):335001. doi: 10.1088/1361-648X/aad34e. Epub 2018 Jul 13.
Uniform graphene films and micro-patterns are the cornerstones of graphene-based printed electronics. However, disk-like reduced graphene oxide (RGO) sheets trend to concentrate at the edge of the drop because of the famous coffee-ring effect, resulting in non-uniform patterns. To understand the physics of coffee-ring formation for RGO droplets on hydrophilic substrates, we propose a mechanical model to elucidate the influence and its mechanism of substrate wettability on the solute migration behavior and solute distribution morphology of RGO droplets. Stronger coffee-ring morphology and a slower velocity transition on the PMMA can be observed as compared to that on the glass slides. An explanation based on the mechanical model is provided as the large contact angle on the PMMA leads to a small hindrance force and finally results in more significant coffee-ring morphology. Remarkably, we have revealed one underlying mechanism by which the hydrophilic substrate with better wettability will form more uniform patterns. This study can provide fundamental insights into the relationship between substrate wettability and RGO sheets distribution morphology. It might contribute to morphology regulation of RGO droplets in the DOD printing of graphene films and micro-patterns.
均匀的石墨烯薄膜和微图案是基于石墨烯的印刷电子学的基石。然而,由于著名的咖啡环效应,盘状还原氧化石墨烯(RGO)片往往会集中在液滴边缘,导致图案不均匀。为了理解亲水性基底上RGO液滴形成咖啡环的物理过程,我们提出了一个力学模型,以阐明基底润湿性对RGO液滴溶质迁移行为和溶质分布形态的影响及其机制。与载玻片相比,可以观察到PMMA上有更强的咖啡环形态和更慢的速度转变。基于力学模型给出了解释,因为PMMA上的大接触角导致较小的阻碍力,最终导致更显著的咖啡环形态。值得注意的是,我们揭示了一种潜在机制,即润湿性更好的亲水性基底会形成更均匀的图案。这项研究可以为基底润湿性与RGO片分布形态之间的关系提供基本见解。它可能有助于在石墨烯薄膜和微图案的按需滴墨印刷中对RGO液滴的形态进行调控。