Department of Mechanical Engineering, Stanford University, Stanford, CA 94305, USA.
Department of Mechanical Engineering, Stanford University, Stanford, CA 94305, USA; Department of Mechanical Engineering, University of California, Merced, CA 95343, USA.
J Colloid Interface Sci. 2018 Nov 15;530:667-674. doi: 10.1016/j.jcis.2018.05.062. Epub 2018 May 22.
The in-plane permeability of porous thin films is an important fluid mechanical property that determines wicking and pressure-driven flow behavior in such materials. This property has so far been challenging to measure directly due to the small sidewall cross-sectional area of thin films available for flow. In this work, we propose and experimentally demonstrate a novel technique for directly measuring in-plane permeability of porous thin films of arbitrary thicknesses, in situ, using a manifold pressed to the top surface of the film. We both measure and simulate the influence of the two dimensional flow field produced in a film by the manifold and extract the permeability from measurements of pressure drop at fixed flow rates. Permeability values measured using the technique for a periodic array of channels are comparable to theoretical predictions. We also determine in-plane permeability of arrays of pillars and electrodeposited porous copper films. This technique is a robust tool to characterize permeability of thin films of arbitrary thicknesses on a variety of substrates. In Supplementary material, we provide a solid model, which is useful in three-dimensional printer reproductions of our device.
多孔薄膜的面内渗透率是一个重要的流体力学性质,它决定了这些材料中的芯吸和压力驱动流动行为。由于可用作流动的薄膜侧壁的截面积很小,因此到目前为止,该特性一直难以直接测量。在这项工作中,我们提出并实验证明了一种新颖的技术,可原位使用压在薄膜顶部表面的歧管直接测量任意厚度的多孔薄膜的面内渗透率。我们测量并模拟了歧管在薄膜中产生的二维流场的影响,并从固定流速下的压降测量中提取渗透率。使用该技术测量的周期性通道阵列的渗透率与理论预测值相当。我们还确定了柱状物和电镀多孔铜薄膜阵列的面内渗透率。该技术是一种强大的工具,可用于在各种衬底上表征任意厚度的薄膜的渗透率。在补充材料中,我们提供了一个实用模型,该模型对于我们设备的三维打印机复制品很有用。