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拟南芥对低温的适应可防止在 9°C 下暴露于 UV-B 辐射对光系统 II 造成的损伤。

Acclimation of Arabidopsis thaliana to low temperature protects against damage of photosystem II caused by exposure to UV-B radiation at 9 °C.

机构信息

Botanical Institute, Christian-Albrechts Universität zu Kiel, Am Botanischen Garten 1-9, D-24118, Kiel, Germany; BioConsult SH GmbH & Co KG, Schobüller Straße 36, D-25813, Husum, Germany.

Botanical Institute, Christian-Albrechts Universität zu Kiel, Am Botanischen Garten 1-9, D-24118, Kiel, Germany.

出版信息

Plant Physiol Biochem. 2019 Jan;134:73-80. doi: 10.1016/j.plaphy.2018.10.017. Epub 2018 Oct 13.

Abstract

Various environmental variables interact with UV-B radiation (280-315 nm), among them temperature. In many plants epidermal UV screening is induced by low temperature even in the absence of UV irradiation. On the other hand, low temperature can aggravate damage caused by UV-B radiation. We investigated the interaction of UV-B radiation and low temperature in Arabidopsis thaliana (L.) Heynh. Exposure of plants grown at moderate temperature (21 °C) to UV-B radiation at 9 °C resulted in significantly higher damage of photosystem II (PS II) as compared to exposure at 21 °C. The higher damage at low temperature was related to slower recovery of maximal PS II quantum efficiency at this temperature. Epidermal UV-B transmittance was measured using a method based on chlorophyll fluorescence measurements. Acclimation to low temperature enhanced epidermal UV-B screening and improved the UV-B resistance considerably. Differences in the apparent UV-B sensitivity of PS II between plants grown in moderate or acclimated to cool temperatures were strongly diminished when damage was related to the UV-B radiation reaching the mesophyll (UV-B) as calculated from incident UV-B irradiance and epidermal UV-B transmittance. Evidence is presented that the remaining differences in sensitivity are caused by an increased rate of repair in plants acclimated to 9 °C. The data suggest that enhanced epidermal UV-B screening at low temperature functions to compensate for slower repair of UV-B damage at these temperatures. It is proposed that the UV-B irradiance reaching the mesophyll should be considered as an important parameter in experiments on UV-B resistance of plants.

摘要

各种环境变量与 UV-B 辐射(280-315nm)相互作用,其中包括温度。在许多植物中,即使没有 UV 辐射,低温也会诱导表皮 UV 屏蔽。另一方面,低温会加重 UV-B 辐射造成的损伤。我们研究了 UV-B 辐射和低温在拟南芥(L.)Heynh 中的相互作用。与在 21°C 下暴露相比,在 9°C 下将在适度温度(21°C)下生长的植物暴露于 UV-B 辐射会导致光合作用 II(PS II)的损伤明显更高。在低温下更高的损伤与该温度下最大 PS II 量子效率的恢复较慢有关。使用基于叶绿素荧光测量的方法测量表皮 UV-B 透射率。在低温下的驯化增强了表皮 UV-B 屏蔽,大大提高了 UV-B 抗性。与从入射 UV-B 辐照度和表皮 UV-B 透射率计算得出到达叶肉的 UV-B 辐射(UV-B)相关联,将中温和驯化至凉爽温度下生长的植物之间 PS II 的表观 UV-B 敏感性差异相关联时,差异大大减小。有证据表明,在驯化至 9°C 的植物中,修复率增加是造成敏感性差异的原因。数据表明,低温下增强的表皮 UV-B 屏蔽功能是为了弥补这些温度下 UV-B 损伤修复较慢的问题。建议应将到达叶肉的 UV-B 辐射视为研究植物对 UV-B 抗性的重要参数。

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