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具有可调谐能隙和近红外光致发光的 GeSn 合金量子点。

GeSn alloy quantum dots with composition-tunable energy gaps and near-infrared photoluminescence.

机构信息

Department of Chemistry, Virginia Commonwealth University, Richmond, Virginia 23284, USA.

出版信息

Nanoscale. 2018 Nov 8;10(43):20296-20305. doi: 10.1039/c8nr04399j.

Abstract

Low-cost, less-toxic, and abundantly-produced Ge1-xSnx alloys are an interesting class of narrow energy-gap semiconductors that received noteworthy interest in optical technologies. Incorporation of α-Sn into Ge results in an indirect-to-direct bandgap crossover significantly improving light absorption and emission relative to indirect-gap Ge. However, the narrow energy-gaps reported for bulk Ge1-xSnx alloys have become a major impediment for their widespread application in optoelectronics. Herein, we report the first colloidal synthesis of Ge1-xSnx alloy quantum dots (QDs) with a narrow size dispersity (3.3 ± 0.5-5.9 ± 0.8 nm), a wide range of Sn compositions (0-20.6%), and composition-tunable energy-gaps and near-infrared (IR) photoluminescence (PL). The structural analysis of the alloy QDs indicates linear expansion of the cubic Ge lattice with increasing Sn, suggesting the formation of strain-free nanoalloys. The successful incorporation of α-Sn into crystalline Ge has been confirmed by electron microscopy, which suggests the homogeneous solid solution behavior of QDs. The quantum confinement effects have resulted in energy gaps that are significantly blue-shifted from bulk Ge for the Ge1-xSnx alloy QDs with composition-tunable absorption onsets (1.72-0.84 eV for x = 1.5-20.6%) and PL peaks (1.62-1.31 eV for x = 1.5-5.6%). Time-resolved PL (TRPL) spectroscopy revealed microsecond and nanosecond timescale decays at 15 K and 295 K, respectively, owing to the radiative recombination of dark and bright excitons as well as the interplay of surface traps and core electronic states. Realization of low-to-non-toxic and silicon-compatible Ge1-xSnx QDs with composition-tunable near-IR PL allows the unprecedented expansion of direct-gap Group IV semiconductors to a wide range of biomedical and advanced technological studies.

摘要

低成本、低毒性且产量高的 Ge1-xSnx 合金是一类很有前途的窄能隙半导体,在光学技术中引起了广泛关注。α-Sn 掺入 Ge 中会导致间接带隙到直接带隙的转变,从而显著提高光吸收和发射效率,与间接带隙 Ge 相比。然而,块状 Ge1-xSnx 合金报道的窄能隙已成为其在光电子学中广泛应用的主要障碍。在此,我们报告了首例具有窄尺寸分散性(3.3 ± 0.5-5.9 ± 0.8nm)、宽 Sn 组成范围(0-20.6%)以及组成可调谐能隙和近红外(IR)光致发光(PL)的 Ge1-xSnx 合金量子点(QD)的胶体合成。合金 QD 的结构分析表明,随着 Sn 的增加,立方 Ge 晶格线性膨胀,表明形成了无应变的纳米合金。电子显微镜证实了成功地将α-Sn 掺入到结晶 Ge 中,这表明 QD 具有均匀的固溶体行为。量子限制效应导致了与块状 Ge 相比,Ge1-xSnx 合金 QD 的能隙显著蓝移,其吸收起始(x = 1.5-20.6%时为 1.72-0.84eV)和 PL 峰(x = 1.5-5.6%时为 1.62-1.31eV)可调谐。时间分辨 PL(TRPL)光谱在 15 K 和 295 K 下分别显示微秒和纳秒时间尺度的衰减,这是由于暗激子和亮激子的辐射复合以及表面陷阱和芯电子态的相互作用所致。实现低毒至无毒且与硅兼容的具有组成可调谐近红外 PL 的 Ge1-xSnx QD,使得直接隙 IV 族半导体在生物医学和先进技术研究中具有前所未有的扩展。

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