Guo Jiang, Suzuki Hirofumi
Key Laboratory for Precision and Non-Traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian 116024, China.
Department of Mechanical Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai, Aichi 487-8501, Japan.
Micromachines (Basel). 2018 Jul 12;9(7):349. doi: 10.3390/mi9070349.
Process parameter conditions such as vibrating motion, abrasives, pressure and tool wear play an important role in vibration-assisted polishing of micro-optic molds as they strongly affect material removal efficiency and stability. This paper presents an analytical and experimental investigation on the effects of process parameters, aimed at clarifying interrelations between material removal and process parameters which affect polishing quantitatively. The material removal rate (MRR) and surface roughness which represent the polishing characteristics were examined under different vibrating motions, grain sizes of abrasives and polishing pressure. The effects of pressure and tool wear conditions on tool influence function were analyzed. The results showed that 2D vibrating motion generated better surface roughness with higher material removal efficiency while a smaller grain size of abrasives created better surface roughness but lower material removal efficiency. MRR gradually decreases with the increase of polishing pressure when it exceeds 345 kPa, and it was greatly affected by the wear of polisher when wear diameter on the polisher's head exceeds 300 μm.
诸如振动运动、磨料、压力和工具磨损等工艺参数条件在微光学模具的振动辅助抛光中起着重要作用,因为它们会强烈影响材料去除效率和稳定性。本文针对工艺参数的影响进行了分析和实验研究,旨在阐明材料去除与定量影响抛光的工艺参数之间的相互关系。在不同的振动运动、磨料粒度和抛光压力下,对代表抛光特性的材料去除率(MRR)和表面粗糙度进行了研究。分析了压力和工具磨损条件对工具影响函数的影响。结果表明,二维振动运动能产生更好的表面粗糙度,且材料去除效率更高;而较小的磨料粒度能产生更好的表面粗糙度,但材料去除效率较低。当抛光压力超过345 kPa时,MRR会随着抛光压力的增加而逐渐降低,并且当抛光头的磨损直径超过300μm时,MRR会受到抛光器磨损的极大影响。