Jeon Bup Ju
Department of Energy and Environmental Engineering, Shinhan University, 30 Beolmadeul-ro 40beon-gil, Dongducheon-si, Gyeonggi-do, 483-777, Republic of Korea.
J Nanosci Nanotechnol. 2019 Mar 1;19(3):1382-1387. doi: 10.1166/jnn.2019.16150.
A low-temperature process is required to deposit fluorine doped tin oxide (FTO) as a transparent conductive oxide on polyethylene terephthalate (PET) substrate, as the latter is polymeric and has a low melting point. An electron cyclotron resonance (ECR) plasma system is the best way to deposit metal oxide with high transparency and electrical conductivity at temperatures below 100 °C. Characteristics of an ECR plasma include its high ionization energy and electron density; however, its use is limited in large-scale deposition. In order to overcome this limitation, a large-scale ECR plasma system with a dual microwave generator was designed by numerical investigation of a laboratory-scale ECR plasma system. FTO films prepared in the laboratory-scale and large-scale systems were compared. The change in electrical resistivity and optical transmittance with deposition pressure in the large-scale ECR plasma system with dual linear microwave generator is similar to that observed in the laboratory-scale ECR plasma system. The velocity distribution of active species near the substrate in the large-scale ECR plasma system showed a very similar pattern to that in the laboratory-scale ECR plasma system over a range of 1.5×10 to 0.8×10 m/s. The electrical resistivity and optical transmittance of FTO films deposited by a large-scale ECR plasma system using a dual microwave generator had respective values of 4.3×10 ~ 9.18×10 Ω ·cm and 86.5~88.2%.
由于聚对苯二甲酸乙二酯（PET）是聚合物且熔点低，因此需要采用低温工艺在PET基板上沉积氟掺杂氧化锡（FTO）作为透明导电氧化物。电子回旋共振（ECR）等离子体系统是在低于100°C的温度下沉积具有高透明度和导电性的金属氧化物的最佳方法。ECR等离子体的特性包括其高电离能和电子密度；然而，其在大规模沉积中的应用受到限制。为了克服这一限制，通过对实验室规模的ECR等离子体系统进行数值研究，设计了一种具有双微波发生器的大规模ECR等离子体系统。比较了在实验室规模和大规模系统中制备的FTO薄膜。具有双线性微波发生器的大规模ECR等离子体系统中，电阻率和光学透过率随沉积压力的变化与在实验室规模的ECR等离子体系统中观察到的变化相似。在1.5×10至0.8×10米/秒的范围内，大规模ECR等离子体系统中靠近基板的活性物种的速度分布与实验室规模的ECR等离子体系统中的速度分布显示出非常相似的模式。使用双微波发生器的大规模ECR等离子体系统沉积的FTO薄膜的电阻率和光学透过率分别为4.3×109.18×10Ω·cm和86.588.2%。
