UV/氯工艺降解抑霉唑：动力学、转化途径及毒性评价。
Degradation of climbazole by UV/chlorine process: Kinetics, transformation pathway and toxicity evaluation.
机构信息
State Key Laboratory of Organic Geochemistry, Guangzhou Institute of Geochemistry, Chinese Academy of Sciences, Guangzhou, 510640, China; The Environmental Research Institute, MOE Key Laboratory of Theoretical Chemistry of Environment, South China Normal University, Guangzhou, 510006, China; University of Chinese Academy of Sciences, Beijing, 100049, China.
The Environmental Research Institute, MOE Key Laboratory of Theoretical Chemistry of Environment, South China Normal University, Guangzhou, 510006, China.
出版信息
Chemosphere. 2019 Mar;219:243-249. doi: 10.1016/j.chemosphere.2018.12.023. Epub 2018 Dec 5.
Climbazole is an antifungal agent widely used in household personal care products, and it was found persistent in chlorination disinfection process. Here we investigated the kinetics and mechanism of climbazole degradation by UV/chlorine process. The results showed that the UV/chlorine process dramatically enhanced degradation of climbazole when compared to the UV photolysis and chlorination alone. The neutral condition (pH 7) produced the highest reaction rate for the climbazole by UV/chlorine among the various pH conditions. Dissolved organic matter and inorganic ions in natural water showed moderate inhibition effects on the degradation of climbazole in the UV/chlorine process. Hydroxyl radical (OH and chlorine radical (Cl) were found to be the main reactive species in the degradation of climbazole, with the second-order rate constant of 1.24 × 10 M s and 6.3 × 10 M s, respectively. In addition, the OH and Cl in the UV/chlorine at 100 μM accounted for 82.2% and 7.7% contributions to the removal of climbazole, respectively. Eleven of main transformation products of climbazole were identified in the UV/chlorine process. These oxidation products did not cause extra toxicity than climbazole itself. The findings from this study show that the combination of chlorination with UV photolysis could provide an effective approach for removal of climbazole during conventional disinfection process.
克霉唑是一种广泛应用于家用个人护理产品的抗真菌剂，在氯化消毒过程中被发现具有持久性。本研究考察了 UV/氯工艺降解克霉唑的动力学和机制。结果表明，与单独的 UV 光解和氯化相比，UV/氯工艺显著增强了克霉唑的降解。在各种 pH 条件下，中性条件（pH 7）下，UV/氯工艺对克霉唑的降解反应速率最高。天然水中的溶解有机物和无机离子对 UV/氯工艺中克霉唑的降解表现出适度的抑制作用。研究发现，羟基自由基（OH·）和氯自由基（Cl·）是降解克霉唑的主要活性物质，其二级反应速率常数分别为 1.24×109 M-1s-1 和 6.3×109 M-1s-1。此外，UV/氯在 100 μM 时，OH 和 Cl 对克霉唑去除的贡献率分别为 82.2%和 7.7%。在 UV/氯过程中鉴定出克霉唑的 11 种主要转化产物。这些氧化产物的毒性没有超过克霉唑本身。本研究结果表明，氯化与 UV 光解相结合可以为常规消毒过程中去除克霉唑提供一种有效方法。
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