Rose H, Nejati A, Müller H
Ulm University, Meyerhofstr. 27, D-89081 Ulm, Germany.
CEOS GmbH, Englerstr. 28, D-69126 Heidelberg, Germany.
Ultramicroscopy. 2019 Aug;203:139-144. doi: 10.1016/j.ultramic.2018.11.014. Epub 2018 Nov 29.
Aberration correction in transmission electron microscopy has proven feasible and useful over a large range of acceleration voltages. The spherical aberration has been corrected for beam energies from 15 kV [1] up to 1.2 MeV [2] while the correction of the chromatic aberration has been achieved for beam energies ranging from 20 kV[3] up to 300 kV[4]. Above this threshold the conventional correction principle based on mixed electric and magnetic focusing elements becomes infeasible with present technology [5]. For conventional electron sources at high voltages the relative energy width of the beam gets so small that chromatic correction becomes less important. Nevertheless, for new applications with pulsed electron sources with energy spreads in the order of 100 eV chromatic aberration will become a limiting factor even at high energies [6]. To enable chromatic aberration correction for such systems a novel type of a feasible, purely magnetic multipole aberration corrector with curved optic axis is proposed which is capable of compensating for the chromatic and spherical aberration up to several MeV.
在透射电子显微镜中,像差校正已被证明在大范围的加速电压下是可行且有用的。对于15 kV[1]至1.2 MeV[2]的束流能量,球差已得到校正,而对于20 kV[3]至300 kV[4]的束流能量,色差已得到校正。高于此阈值,基于混合电场和磁场聚焦元件的传统校正原理在现有技术下变得不可行[5]。对于高压下的传统电子源,束流的相对能量宽度变得非常小,以至于色差校正变得不那么重要。然而,对于具有约100 eV能量展宽的脉冲电子源的新应用,即使在高能量下,色差也将成为一个限制因素[6]。为了实现此类系统的色差校正,提出了一种新型的可行的、具有弯曲光轴的纯磁多极像差校正器,它能够补偿高达数MeV的色差和球差。