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片上场放大样品堆积中的标度行为。

Scaling behavior in on-chip field-amplified sample stacking.

机构信息

Department of Mechanical Engineering, Indian Institute of Technology Delhi, Delhi, India.

出版信息

Electrophoresis. 2019 Mar;40(5):730-739. doi: 10.1002/elps.201800392. Epub 2019 Jan 23.

Abstract

Field amplified sample stacking (FASS) uses differential electrophoretic velocity of analyte ions in the high-conductivity background electrolyte zone and low conductivity sample zone for increasing the analyte concentration. The stacking rate of analyte ions in FASS is limited by molecular diffusion and convective dispersion due to nonuniform electroosmotic flow (EOF). We present a theoretical scaling analysis of stacking dynamics in FASS and its validation with a large set of on-chip sample stacking experiments and numerical simulations. Through scaling analysis, we have identified two stacking regimes that are relevant for on-chip FASS, depending upon whether the broadening of the stacked peak is dominated by axial diffusion or convective dispersion. We show that these two regimes are characterized by distinct length and time scales, based on which we obtain simplified nondimensional relations for the temporal growth of peak concentration and width in FASS. We first verify the theoretical scaling behavior in diffusion- and convection-dominated regimes using numerical simulations. Thereafter, we show that the experimental data of temporal growth of peak concentration and width at varying electric fields, conductivity gradients, and EOF exhibit the theoretically predicted scaling behavior. The scaling behavior described in this work provides insights into the effect of varying experimental parameters, such as electric field, conductivity gradient, electroosmotic mobility, and electrophoretic mobility of the analyte on the dynamics of on-chip FASS.

摘要

场放大样品堆积(FASS)利用分析物离子在高导电性背景电解质区和低导电性样品区中的不同电泳速度来增加分析物浓度。由于非均匀电渗流(EOF),分析物离子在 FASS 中的堆积速率受到分子扩散和对流弥散的限制。我们提出了一种 FASS 堆积动力学的理论缩放分析,并通过大量的芯片上样品堆积实验和数值模拟对其进行了验证。通过缩放分析,我们确定了两种与芯片上 FASS 相关的堆积模式,这取决于堆积峰的展宽是由轴向扩散还是对流弥散主导。我们表明,这两种模式的特征是基于不同的长度和时间尺度,根据这些尺度,我们得到了 FASS 中峰浓度和宽度随时间增长的简化无量纲关系。我们首先使用数值模拟验证了扩散和对流主导模式下的理论缩放行为。此后,我们表明,在不同电场、电导率梯度和EOF 下,峰浓度和宽度随时间增长的实验数据表现出理论预测的缩放行为。这项工作中描述的缩放行为提供了对不同实验参数(如电场、电导率梯度、EOF 迁移率和分析物的电泳迁移率)对芯片上 FASS 动力学影响的深入了解。

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