Rajesh N, Rajesh Vidya
Department of Biological Sciences, Birla Institute of Technology and Science, Pilani, Hyderabad Campus, Jawahar Nagar, Shameerpet Mandal, R.R. Dist, Telangana 500 078, India.
Department of Chemistry, Birla Institute of Technology and Science, Pilani, Hyderabad Campus, Jawahar Nagar, Shameerpet Mandal, R.R. Dist, Telangana 500 078, India.
J Genet Eng Biotechnol. 2016 Jun;14(1):177-180. doi: 10.1016/j.jgeb.2016.02.002. Epub 2016 Mar 24.
isolated from an electronic industry effluent had high level of resistance to heavy metals like cadmium, lead, zinc and to various antibiotics. Minimum Inhibitory Concentration (MIC) of the strain toward cadmium and lead was found to be 200 mg L and 400 mg L respectively, while it could tolerate zinc up to 250 mg L and chromium up to 150 mg L. The present study proved the genetic contribution of heavy metal resistance in this strain to be plasmid mediated. Isolation of the plasmid from and its subsequent linearization with confirmed the presence of a plasmid of size >10 kb. Plasmid curing experiments affirmed plasmid mediated heavy metal resistance. Additionally, genetic transformation of a non metal resistant lab strain and the cured strain of with the isolated plasmid increased their metal tolerance level by 50% confirming the genetic determinant to be present in the plasmid.
从电子工业废水中分离出的菌株对镉、铅、锌等重金属以及多种抗生素具有高度抗性。该菌株对镉和铅的最低抑菌浓度（MIC）分别为200 mg/L和400 mg/L，而它能耐受高达250 mg/L的锌和150 mg/L的铬。本研究证明该菌株中重金属抗性的遗传贡献是由质粒介导的。从该菌株中分离质粒并随后用酶将其线性化，证实存在大小大于10 kb的质粒。质粒消除实验证实了质粒介导的重金属抗性。此外，用分离出的质粒对非金属抗性实验室菌株和该菌株的治愈菌株进行遗传转化，使其金属耐受水平提高了50%，证实遗传决定因素存在于质粒中。
