Gankin Alina, Mervinetsky Evgeniy, Alshanski Israel, Buchwald Jörg, Dianat Arezoo, Gutierrez Rafael, Cuniberti Gianaurelio, Sfez Ruthy, Yitzchaik Shlomo
Institute for Materials Science and Max Bergmann Center of Biomaterials , TU Dresden , Dresden 01062 , Germany.
Dresden Center for Computational Materials Science , TU Dresden , Dresden 01062 , Germany.
Langmuir. 2019 Feb 26;35(8):2997-3004. doi: 10.1021/acs.langmuir.8b03943. Epub 2019 Feb 13.
The ability to tune the electronic properties of oxide-bearing semiconductors such as Si/SiO or transparent metal oxides such as indium-tin oxide (ITO) is of great importance in both electronic and optoelectronic device applications. In this work, we describe a process that was conducted on n-type Si/SiO and ITO to induce changes in the substrate work function (WF). The substrates were modified by a two-step synthesis comprising a covalent attachment of coupling agents' monolayer followed by in situ anchoring reactions of polarizable chromophores. The coupling agents and chromophores were chosen with opposite dipole orientations, which enabled the tunability of the substrates' WF. In the first step, two coupling agents with opposite molecular dipole were assembled. The coupling agent with a negative dipole induced a decrease in WF of modified substrates, while the coupling agent with a positive dipole produced an increase in WFs of both ITO and Si substrates. The second modification step consisted of in situ anchoring reaction of polarizable chromophores with opposite dipoles to the coupling layer. This modification led to an additional change in the WFs of both Si/SiO and ITO substrates. The WF was measured by contact potential difference and modeled by density functional theory-based theoretical calculations of the WF for each of the assembly steps. A good fit was obtained between the calculated and experimental trends. This ability to design and tune the WF of ITO substrates was implemented in an organic electronic device with improved I- V characteristics in comparison to a bare ITO-based device.
调节含氧化物半导体(如Si/SiO)或透明金属氧化物(如氧化铟锡(ITO))的电子特性,在电子和光电器件应用中都非常重要。在这项工作中,我们描述了一个在n型Si/SiO和ITO上进行的过程,以诱导衬底功函数(WF)的变化。通过两步合成对衬底进行改性,第一步是共价连接偶联剂单层,然后是可极化发色团的原位锚定反应。选择具有相反偶极取向的偶联剂和发色团,从而实现衬底WF的可调性。第一步,组装两种具有相反分子偶极的偶联剂。具有负偶极的偶联剂使改性衬底的WF降低,而具有正偶极的偶联剂使ITO和Si衬底的WF都增加。第二步改性是可极化发色团与偶联层具有相反偶极的原位锚定反应。这种改性导致Si/SiO和ITO衬底的WF都发生额外变化。通过接触电势差测量WF,并通过基于密度泛函理论的每个组装步骤WF的理论计算进行建模。计算趋势与实验趋势之间取得了良好的拟合。与基于裸ITO的器件相比,这种设计和调节ITO衬底WF的能力在具有改善的I-V特性的有机电子器件中得以实现。