Lee Khang June, Kim Shinho, Hong Woonggi, Park Hamin, Jang Min Seok, Yu Kyoungsik, Choi Sung-Yool
School of Electrical Engineering, Center for Advanced Materials Discovery towards 3D Displays, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon, 34141, Republic of Korea.
Sci Rep. 2019 Feb 4;9(1):1199. doi: 10.1038/s41598-018-37882-z.
Plasmonic coupling provides a highly localized electromagnetic field in the gap of noble metals when illuminated by a light. The plasmonic field enhancement is generally known to be inversely proportional to the gap distance. Given such a relation, reducing the gap distance appears to be necessary to achieve the highest possible field enhancement. At the sub-nanometer scale, however, quantum mechanical effects have to be considered in relation to plasmonic coupling. Here, we use graphene as a spacer to observe plasmonic field enhancement in sub-nanometer gap. The gap distance is precisely controlled by the number of stacked graphene layers. We propose that the sudden drop of field enhancement for the single layer spacer is originated from the plasmon tunneling through the thin spacer. Numerical simulation which incorporates quantum tunneling is also performed to support the experimental results. From the fact that field enhancement with respect to the number of graphene layers exhibits different behavior in two wavelengths corresponding to on- and off-resonance conditions, tunneling phenomenon is thought to destroy the resonance conditions of plasmonic coupling.
当受到光照射时,等离子体耦合在贵金属的间隙中提供高度局域化的电磁场。一般认为,等离子体场增强与间隙距离成反比。鉴于这种关系,似乎有必要减小间隙距离以实现尽可能高的场增强。然而,在亚纳米尺度下,必须考虑与等离子体耦合相关的量子力学效应。在此,我们使用石墨烯作为间隔层来观察亚纳米间隙中的等离子体场增强。间隙距离由堆叠的石墨烯层数精确控制。我们提出,单层间隔层的场增强突然下降源于等离子体隧穿穿过薄间隔层。还进行了包含量子隧穿的数值模拟以支持实验结果。从场增强相对于石墨烯层数在对应于共振和非共振条件的两个波长下表现出不同行为这一事实来看,隧穿现象被认为破坏了等离子体耦合的共振条件。